Dielectric Heater Layout to Suppress Plasma Coil Interference
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Solution Overview
Problem
Electromagnetic interference between the heater and the induction coil in plasma processing apparatuses leads to reduced plasma generation efficiency.
Innovation Solution
The plasma processing apparatus includes a configuration where the electric heater is divided into two heaters connected by a joint, with each heater having resistors extending in specific directions, and a power source applies voltage across these resistors to cancel induced electromotive forces, reducing magnetic coupling and interference.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a heater is provided between the dielectric member and the induction coil to heat the dielectric member, then the dielectric member can be heated effectively, but electromagnetic interference occurs between the heater and the induction coil which reduces plasma generation efficiency
Solution Approach 1:
The heater is divided into multiple heater sections (first heater section, second heater section, third heater section) arranged in the circumferential direction. Each section is independently controlled and can be selectively heated based on the required temperature distribution, reducing unnecessary electromagnetic interference while maintaining effective heating of the dielectric member
Solution Approach 2:
Different heater sections are configured to provide different heating characteristics at different locations. The first heater section has a different radial directionality compared to the second and third heater sections, allowing localized heating optimization and minimizing electromagnetic interference in specific regions where it would most affect plasma generation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration suppresses interference between the induction coil and the electric heater, thereby maintaining or enhancing plasma generation efficiency.
Implementation Method 1
When high-frequency power is applied to a coil, a high-frequency magnetic field is generated, and the generated magnetic field acts on a feed gas in the chamber to generate plasma
Implementation Method 2
an electric heater that is provided between the dielectric member and the induction coil and that heats the dielectric member
Data Source
AI summary
A plasma processing apparatus includes a stage, a chamber, a dielectric member, an induction coil, an electric heater, and a power source section. The electric heater includes a first heater that heats a first region of the dielectric member, a second heater that heats a second region of the dielectric member, and a joint that connects these. A first resistor of the first heater extends in a specific direction from a first end to a second end along a first locus corresponding to the first region. A second resistor of the second heater extends in the specific direction from a third end to a fourth end along a second locus corresponding to the second region. The joint connects the first end and the third end. The power source section applies a voltage across the second end and the fourth end.