Dielectric Surface Potential Measurement in Plasma via Intermediary Electrostatic Receiver
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Solution Overview
Problem
Existing methods are unable to accurately measure the surface potential of dielectric materials in plasma environments, especially under dusty surface conditions, leading to unreliable measurements and a lack of empirical data for designers of dielectric coverings for spacecraft and other applications.
Innovation Solution
A system and method involving a vacuum chamber, a conductive probe with terminus in contact with the dielectric material, and a non-contact electrostatic voltmeter to measure the floating potential of an electrostatic receiver, which corresponds to the dielectric potential of the material, allowing for accurate voltage measurement in plasma environments.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a non-contacting probe is used to measure surface potential in a vacuum chamber, then the measurement can be performed without physical contact with the dielectric material, but the measurement becomes unreliable when plasma is present because transient effects introduce measurement errors
Solution Approach 1:
The patent introduces an electrostatic receiver as an intermediary component. The conductive probe contacts the dielectric material and transfers its potential to the electrostatic receiver, which is then measured by the non-contacting ESVM. This intermediary approach allows the ESVM to measure potential accurately without being directly exposed to plasma transient effects, resolving the contradiction between non-contact measurement capability and measurement accuracy in plasma environments.
2Measurement precision
If the plasma source is turned off to read probe results, then transient effects are eliminated, but the measurement cannot be performed in the actual plasma environment where the dielectric material is charged
Solution Approach 1:
The electrostatic receiver serves as a mediator that can be measured outside the vacuum chamber while representing the potential of the dielectric material inside the plasma environment. This allows the measurement system to operate in the plasma environment without turning off the plasma source, maintaining both measurement accuracy and plasma environment adaptability simultaneously.
Solution Approach 2:
The measurement system is segmented into two separate locations: the dielectric material in the plasma environment inside the vacuum chamber, and the electrostatic receiver outside the vacuum chamber where measurements are taken. This spatial segmentation allows the plasma source to remain on inside the chamber while enabling accurate measurements outside, resolving the contradiction between measurement precision and plasma environment adaptability.
3Device complexity
If existing test methods are used to measure surface potential of dielectric materials with dusty surface conditions, then the measurement process is simple, but the measurements do not agree with theoretical predictions and are therefore unreliable
Solution Approach 1:
The electrostatic receiver acts as a reliable intermediary that accurately captures the potential of dielectric materials under dusty surface conditions in plasma. By using this intermediary approach with proper electrical connection through the conductive probe, the system achieves both simplicity in implementation and reliability in measurements that agree with theoretical predictions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise measurement of surface potential of dielectric materials in plasma environments, including dusty conditions, providing reliable data for design improvements and reducing the risk of static discharge in space and vacuum applications.
Implementation Method 1
a non-contact electrostatic voltmeter configured to measure a floating potential of the electrostatic receiver that corresponds to a dielectric potential of the dielectric material
Implementation Method 2
a conductive probe having a first terminus in contact with the dielectric material in the vacuum chamber and a second terminus in electrical communication with the electrostatic receiver
Implementation Method 3
a plasma source configured to generate plasma into the vacuum chamber
Data Source
AI summary
A system for voltage measurement of dielectric material in plasma includes a vacuum chamber. The system also includes an electrostatic receiver located outside of the vacuum chamber. The system also includes a conductive probe having a first terminus in contact with the dielectric material in the vacuum chamber and a second terminus in electrical communication with the electrostatic receiver. The system also includes a non-contact electrostatic voltmeter configured to measure a floating potential of the electrostatic receiver that corresponds to a dielectric potential of the dielectric material at a location in contact with the first terminus of the conductive probe.