Dielectric Window Gas Channel Layout for Uniform Plasma Feed
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Solution Overview
Problem
Existing plasma processing systems face challenges in achieving uniform gas distribution within the chamber while preventing abnormal discharge, particularly when using gas injectors that are positioned near the antenna coils, leading to inefficiencies and potential discharge abnormalities.
Innovation Solution
The system incorporates a dielectric window with radially extending gas channels and a coiled antenna configuration, where gas channels are designed to avoid overlap with the antenna coils, ensuring even gas supply and minimizing the risk of abnormal discharge by controlling the angle and distance of gas channels relative to the coils.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If gas injectors are positioned near the antenna coils to improve gas supply efficiency, then gas distribution uniformity is improved, but abnormal discharge occurs
Solution Approach 1:
A dielectric window is introduced as an intermediary component between the antenna coils and the gas channels. The dielectric window allows the magnetic field to pass through while providing mechanical support for the gas channels, enabling gas injection without direct contact with the antenna coils, thus preventing abnormal discharge while maintaining gas distribution uniformity
Solution Approach 2:
The gas channels are configured to extend in the radial direction of the dielectric window, changing the spatial dimension of gas injection from axial (parallel to antenna axis) to radial (perpendicular to antenna axis). This dimensional change allows gas to be supplied uniformly without interfering with the antenna coils' electromagnetic field, resolving the contradiction between gas distribution and discharge stability
2Reliability
If gas channels are positioned to avoid antenna coils to prevent abnormal discharge, then discharge stability is improved, but gas distribution uniformity deteriorates
Solution Approach 1:
The dielectric window is segmented with multiple radially extending gas channels distributed across its surface. This segmentation allows gas to be injected at multiple locations simultaneously, achieving uniform gas distribution across the chamber while maintaining sufficient distance from the antenna coils to prevent abnormal discharge
Solution Approach 2:
The gas channels are strategically positioned in regions where they can achieve uniform gas distribution without overlapping the antenna coils. The radial configuration ensures that different regions of the dielectric window receive appropriate gas flow, maintaining local quality uniformity while avoiding the harmful electromagnetic field regions
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration achieves uniform gas distribution and suppresses abnormal discharge, resulting in efficient plasma generation and processing uniformity within the chamber.
Implementation Method 1
an antenna provided above of the chamber and around the gas supply part to generate plasma of the processing gas in the chamber by supplying high frequency waves into the chamber
Implementation Method 2
a dielectric window that constitutes an upper part of the chamber
Data Source
AI summary
A plasma processing apparatus includes a chamber including a dielectric window constituting an upper part of the chamber and formed therein with a plurality of gas channels, a gas supply section connected to the plurality of gas channels and configured to supply processing gas to the chamber, an antenna assembly that is disposed above the chamber, is set with a first surrounding region, a second surrounding region, and a third surrounding region, and includes a primary coil disposed in the third surrounding region and a secondary coil disposed in the first surrounding region, and an RF power supply configured to supply RF power to at least one of the primary coil and the secondary coil. Each gas channel extends in a radial direction of the dielectric window and is formed so that distances from a gas supply port to gas introduction ports are equal to each other.