Diffractive Facet Mirrors for EUV Lithography Beam Shaping

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Solution Overview

Problem

Conventional EUV lithography systems face challenges in achieving precise beam shaping and homogenization due to manufacturing errors in facet elements, leading to light losses and non-ideal imaging.

Innovation Solution

The use of diffractive optical elements, specifically facet mirrors with grating structures and multilayer coatings, to diffract EUV radiation and achieve desired beam profiles, allowing for flexible geometry and improved homogenization of the illumination field.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional production methods are used to manufacture facet elements with precise surface forms for imaging, then manufacturing precision can be improved, but manufacturing complexity and expenditure increase significantly

Engineering Contradiction:
Improvesurface form precisionVSAvoidmanufacturing complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent changes the fundamental parameter of beam shaping from geometric surface form to diffractive phase modulation. Instead of manufacturing complex spherical or aspherical surface forms, the invention uses planar or simple curved surfaces with diffractive grating structures that achieve beam shaping through phase diffraction. This parameter change from geometric to diffractive optics resolves the contradiction by enabling precise beam control with simpler manufacturing.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention replaces the mechanical/optical system of precise surface form manufacturing with a diffractive optical system. Instead of relying on mechanically manufactured surface precision, the patent uses diffractive gratings with sub-wavelength structures that achieve beam shaping through interference and diffraction effects. This substitution eliminates the need for complex surface form manufacturing while maintaining or improving beam control precision.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Ease of manufacture

If facet elements are manufactured with conventional methods, then ease of manufacture is maintained, but imaging quality and homogenization performance deteriorate due to manufacturing errors

Engineering Contradiction:
ImprovemanufacturabilityVSAvoidimaging quality
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent shifts the critical manufacturing parameter from macroscopic surface form (which is difficult to control with conventional methods) to microscopic grating period and depth (which can be controlled with lithographic techniques). The diffractive approach allows manufacturing with standard semiconductor fabrication processes, achieving both ease of manufacture and high precision imaging quality simultaneously.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention moves the precision requirement from the surface geometry dimension to the sub-wavelength grating structure dimension. By creating periodic structures with periods smaller than the wavelength of EUV radiation, the patent achieves precise beam control through diffraction effects while using manufacturing processes designed for sub-wavelength feature creation, thus improving imaging quality without sacrificing manufacturability.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Ease of manufacture

If simple planar surfaces are used for facet elements, then ease of manufacture improves, but beam shaping capability and homogenization performance worsen

Engineering Contradiction:
Improvesurface fabrication simplicityVSAvoidbeam shaping capability
Core Design Contradiction:
Ease of manufactureVSIllumination intensity

Solution Approach 1:

The patent changes the mechanism of beam shaping from geometric surface form to diffractive phase modulation. Simple planar surfaces are combined with diffractive grating structures that impose phase variations on the incident beam. This parameter change allows the use of simple surfaces while achieving sophisticated beam shaping and homogenization through the diffractive phase profile encoded in the grating structure.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention creates a composite optical element combining a simple substrate surface with a diffractive grating structure and multilayer coating. The composite structure integrates the manufacturing simplicity of planar surfaces with the beam shaping capability of diffractive optics, achieving both ease of manufacture and superior beam control through the synergistic combination of these elements.

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach simplifies the production of facet elements, enhances the uniformity of illumination, and enables location-dependent pupil variations, improving the efficiency and precision of EUV lithography systems.

Implementation Method 1

at least one of the facet elements of the first facet mirror or of the second facet mirror is designed as a diffractive optical element for diffracting the EUV radiation

Methodology Applied
Scientific EffectDiffraction: Diffraction

Implementation Method 2

a substrate and a multilayer coating that reflects EUV radiation, the multilayer coating being applied to the substrate

Methodology Applied
Scientific EffectReflection: Reflection

Data Source

PatentUS9551941B2Illumination system for an EUV lithography device and facet mirror therefor
Publication Date: 2017.01.24 CARL ZEISS SMT GMBH
  • US9551941B2 patent drawing
  • US9551941B2 patent drawing
  • US9551941B2 patent drawing

AI summary

The invention relates to an illumination system for an EUV lithography device, comprising: a first facet mirror having facet elements that reflect EUV radiation, and a second facet mirror having facet elements for reflecting the EUV radiation reflected by the first facet mirror onto an illumination field. At least one of the facet elements of the first facet mirror or of the second facet mirror is designed as a diffractive optical element for diffracting the EUV radiation. In particular, at least one of the facet elements of the second facet mirror is designed as a diffractive optical element for illuminating only a part of the illumination field. The invention also relates to an EUV lithography device comprising such an illumination system, and to a facet mirror comprising at least one diffractive facet element.