Interferometric Surface Shape Measurement Using Diffractive Optical Elements

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Solution Overview

Problem

Diffractive optical elements cause measurement errors in interferometric methods, reducing the accuracy of determining optical surface shape.

Innovation Solution

Use two diffractive optical elements with different diffraction structures to generate test waves that correspond to the same points on the surface, capturing interferograms sequentially to minimize measurement errors by eliminating interference radiation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a diffractive optical element is used to generate test waves with wavefronts adapted to the target surface, then the measurement capability for complex optical surfaces is improved, but measurement errors are introduced due to interference radiation

Engineering Contradiction:
Improvesurface shape determination accuracyVSAvoidinterference radiation
Core Design Contradiction:
Measurement precisionVSObject-generated harmful factors

Solution Approach 1:

The patent changes the diffraction properties of the optical element by using multiple diffractive optical elements with different diffraction structures. Each element has distinct diffraction efficiencies and interference patterns, allowing the system to capture multiple interferograms with varying interference characteristics. By combining these interferograms, the system maintains measurement capability while reducing the impact of interference radiation through computational processing.

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If multiple diffractive optical elements with different configurations are used to eliminate interference errors, then measurement accuracy is improved, but device complexity increases

Engineering Contradiction:
Improvesurface shape determination accuracyVSAvoidmeasurement arrangement complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent makes the measurement arrangement multi-functional by enabling the same optical setup to capture multiple interferograms with different diffraction characteristics. The evaluation device performs multiple functions: capturing individual interferograms, identifying interference patterns, and computationally combining them to eliminate errors. This software-based approach reduces hardware complexity compared to using physically separate measurement systems.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent employs periodic action by sequentially capturing multiple interferograms using different diffractive optical elements. The system systematically varies the diffraction configuration across multiple measurements, allowing the evaluation device to identify and eliminate interference patterns through their periodic variation. This structured repetition enables error elimination without requiring complex real-time adjustments.

Inventive Principle:
Principle #19Periodic action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Improves measurement accuracy by reducing the influence of interference radiation, enhancing the precision of determining optical surface shape.

Implementation Method 1

arranging a first diffractive optical element in the beam path of an input wave to generate a first test wave with a wavefront at least partially adapted to a target shape of the optical surface

Methodology Applied
Scientific EffectDiffraction: Diffraction

Implementation Method 2

acquiring a first interferogram generated by the first test wave after interaction with the surface of the test object

Methodology Applied
Scientific EffectInterference: Interference

Data Source

PatentEP3948156B1Measuring method for interferometrically determining a surface shape
Publication Date: 2025.12.24 CARL ZEISS SMT GMBH
  • EP3948156B1 patent drawingFigure 1
  • EP3948156B1 patent drawingFigure 2~3
  • EP3948156B1 patent drawingFigure 4

AI summary

A measuring method for interferometrically determining a shape of a surface (12) of a test object (14) comprises the steps of arranging a first diffractive optical element (30, 130, 230) in the beam path of an input wave (18) for generating a first test wave (34) with a wavefront at least partly adapted to an intended shape of the optical surface, capturing a first interferogram generated by means of the first test wave following an interaction with the surface (12) of the test object (14), arranging a further diffractive optical element (32, 232) in place of the first diffractive optical element in the beam path of the input wave for generating a further test wave with a wavefront at least partly adapted to the intended shape of the optical surface (12), the first diffractive optical element and the further diffractive optical element differing in the configuration of the relevant diffraction structures, capturing a further interferogram generated by means of the further test wave following an interaction with the surface (12) of the test object (14), and determining the shape of the surface of the test object by combining the two interferograms by calculation.