Diffuser Support Member for Plasma Chamber
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Solution Overview
Problem
Current diffuser designs in plasma chambers for large substrates face issues such as sagging, creeping, and cracking due to high processing temperatures and gravitational forces, affecting substrate processing uniformity and increasing maintenance and replacement costs.
Innovation Solution
A gas distribution apparatus with a diffuser support member movably disposed through a backing plate, allowing for variable spacing and vacuum pressure application, which maintains consistent positioning of the diffuser independent of backing plate movement, thereby reducing sagging and maintaining uniform plasma processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If a diffuser is supported rigidly in a plasma chamber, then structural stability is improved, but the diffuser experiences sagging, creeping, and cracking due to high processing temperatures and gravitational forces
Solution Approach 1:
The patent transitions from a rigid fixed support to a dynamic flexible suspension system using bellows-like structures that allow the diffuser to move and flex in response to thermal expansion and gravitational forces, preventing structural failure while maintaining positioning stability
Solution Approach 2:
The patent employs flexible bellows-like suspension structures that can expand and contract to accommodate thermal changes and mechanical stresses, allowing the diffuser to maintain its position without rigid constraints that would cause cracking and creeping
2Strength
If the backing plate is made rigid to maintain chamber structure, then structural strength is improved, but the backing plate cannot flex in response to vacuum pressure changes
Solution Approach 1:
The patent introduces flexible bellows structures that enable the backing plate assembly to dynamically expand and contract in response to vacuum pressure changes, combining structural strength with adaptive flexibility
3Manufacturing precision
If the diffuser is tightly coupled to the backing plate, then positioning precision is improved, but the diffuser position varies when the backing plate moves or flexes
Solution Approach 1:
The flexible suspension system allows the diffuser to move independently with the backing plate while maintaining consistent spacing, absorbing position variations through controlled flexing rather than rigid coupling
Solution Approach 2:
The bellows-like flexible structures provide a coupling mechanism that maintains precise spacing while accommodating movements of the backing plate, decoupling position stability from rigid attachment
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures consistent spacing between the diffuser and substrate, improving plasma processing uniformity and reducing maintenance needs by supporting the diffuser's center area independently of the backing plate's position, thus enhancing the stability and longevity of the apparatus.
Implementation Method 1
a vacuum pressure is applied within the chamber interior volume in which the backing plate flexes in response to the vacuum pressure
Data Source
AI summary
Embodiments of gas distribution apparatus comprise a diffuser support member coupled to a diffuser and movably disposed through a backing plate. Embodiments of methods of processing a substrate on a substrate receiving surface of a substrate support comprise providing a diffuser in which a diffuser support member supports the diffuser and is movably disposed through the backing plate.