Digital Imaging System for Precise Color Filter Deposition
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Solution Overview
Problem
Current methods for forming color filters in electronic displays, such as LCD and electrophoretic displays, face challenges in achieving precise alignment and disrupting regular patterns, leading to suboptimal image quality and increased complexity in the manufacturing process.
Innovation Solution
A digital imaging system is used to selectively deposit filter material on display substrates by receiving orientation information, identifying pixels, and controlling the deposition of filter material at specific locations to meet alignment criteria, introducing random variations to disrupt regular patterns and ensure precise placement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photolithographic techniques are used to produce color filters, then manufacturing precision can be achieved, but device complexity and manufacturing process complexity increase
Solution Approach 1:
The patent replaces traditional photolithographic mechanical systems with a digital imaging system that uses digital masks and selective light blocking to form color filters. This substitution simplifies the manufacturing process while maintaining precision by using digital control rather than complex mechanical alignment systems.
Solution Approach 2:
The patent applies preliminary action by pre-defining the positions of color filter elements using digital masks before the actual deposition process. The controller stores mask information that specifies exact deposition locations, allowing the system to prepare the alignment strategy in advance and execute it automatically during deposition, thereby reducing real-time complexity.
2Manufacturing precision
If color filter elements are formed separately on glass substrates and then aligned to TFT layers, then manufacturing precision can be achieved, but loss of time increases due to additional alignment steps
Solution Approach 1:
The patent merges the color filter formation process directly with the TFT layer substrate by depositing color filters onto the same substrate that will hold the TFT elements. This eliminates the separate glass substrate step and the subsequent alignment operation between two separate substrates, thereby reducing time loss while maintaining precision through direct digital positioning.
Solution Approach 2:
The system performs preliminary action by pre-calculating and storing the optimal deposition locations for color filter elements relative to TFT pixel positions in the controller's memory. This pre-computed mask information guides the deposition system to place filters correctly on the first pass, eliminating the need for separate alignment operations and reducing time loss.
3Productivity
If filter material is deposited at regular intervals, then productivity can be improved, but object-generated harmful factors increase due to regular patterns affecting image quality
Solution Approach 1:
The patent applies asymmetry by intentionally introducing non-uniform spacing between color filter elements in certain regions of the display. The system varies the deposition pattern from regular to irregular in specific areas, which disrupts the formation of visible interference patterns while maintaining overall productivity through efficient digital control of the deposition process.
Solution Approach 2:
The system applies local quality by allowing different deposition patterns in different regions of the display substrate. Areas prone to showing regular pattern interference receive irregular spacing, while other areas maintain regular spacing for optimal productivity. The controller selectively applies different mask patterns to different regions based on the specific display area and viewing conditions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables precise and efficient formation of color filter elements on display substrates, improving image quality by avoiding regular pattern disruptions and simplifying the manufacturing process by eliminating the need for additional alignment steps.
Implementation Method 1
a digital imaging system operable to selectively deposit filter material at a plurality of deposition locations
Data Source
AI summary
A method and system for forming filter elements on a plurality of display substrates using a digital imaging system operable to selectively deposit filter material at a plurality of deposition locations is disclosed. The method involves receiving orientation information defining a disposition of a plurality of pixels associated with the at least one display substrate, identifying pixels in the plurality of pixels that are to receive filter material for forming a filter element on the pixel, selecting deposition locations within each of the identified pixels in accordance with the orientation information to meet an alignment criterion associated with placement of the filter element within the pixel, and controlling the digital imaging system to cause deposition of the filter material at the selected deposition locations. A method and system for forming filter elements on a substrate is also disclosed, which involves selecting locations to receive filter material for forming filter elements on the substrate, introducing a random variation in placement of the filter elements, and forming filter elements at the selected locations, the substrate being subsequently aligned to a display substrate for forming a display. A method and system for forming filter elements on a display substrate is also disclosed, which involves selectively depositing filter material to form the filter elements on a plurality of pixels associated with the display substrate, and selectively exposing the deposited filter material to thermal laser radiation to condition the deposited filter material.