Digital Lithography Pattern File Optimization

The patent uses digital copying to replace physical photomask fabrication. Design patterns are digitized directly and transferred electronically to the digital lithography device, eliminating the need to create physical photomask copies. This digital copying process maintains manufacturing precision while dramatically reducing the time and cost associated with physical photomask production and verification

The patent replaces the mechanical photomask fabrication and verification system with a digital processing system. Instead of physically creating and examining photomasks, the system uses digital pattern files that are processed computationally, substituting mechanical operations with digital/ computational operations that are faster and more efficient

The patent segments the optimization process into distinct sequential steps: removing redundant cells, reducing arc vertexes, replacing cells with alternative versions, and converting polygons to quad polygons. Each step performs a specific optimization function and compares results independently. This segmentation allows the system to process design patterns in manageable stages, reducing the computational energy required compared to a monolithic optimization process

The patent applies partial optimization actions at each step rather than attempting complete optimization all at once. Each optimization step performs a specific partial transformation (e.g., only removing redundant cells, then only reducing arc vertexes), and the results are compared and validated at each stage. This approach reduces processing energy by breaking down the complex optimization task into smaller, less computationally intensive partial actions

The patent divides the optimization process into four distinct segmented steps: (1) removing redundant cells, (2) reducing arc vertexes, (3) replacing cells with alternative versions, and (4) converting polygons to quad polygons. Each step is a separate, well-defined operation with clear input and output. This segmentation makes the complex optimization process more manageable and easier to implement, reducing perceived device complexity while maintaining manufacturing precision

The patent performs preliminary comparisons at each optimization step to validate results before proceeding to the next step. Each optimization action is followed by a comparison operation that checks the results against the previous state. This preliminary validation approach ensures that each step contributes meaningfully to the final optimized design, preventing unnecessary complexity from accumulating in the processing system