Dihydroxynaphthalene Condensate Sulfur Purification for Filterability
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Solution Overview
Problem
Dihydroxynaphthalene resins used in semiconductor manufacturing face challenges with soft particle generation and filterability issues due to sulfur impurities, leading to clogged filters and decreased yield in semiconductor production.
Innovation Solution
A method to produce dihydroxynaphthalene condensate with a sulfur element content of 100 ppm or less, using a condensation agent in the presence of an acid or base, which suppresses soft particle generation and enhances filterability, allowing for precise filtration through filters with openings of 20 nm or less.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If dihydroxynaphthalene with conventional sulfur content (several hundred ppm to several thousand ppm) is used, then the resin has good filling and planarizing properties, but soft particles are generated that clog filters with openings of 20 nm or less
Solution Approach 1:
The patent applies parameter changes by reducing the sulfur element content from conventional levels (several hundred ppm to several thousand ppm) to 100 ppm or less. This parameter change in the dihydroxynaphthalene raw material prevents soft particle generation during filtration, resolving the contradiction between maintaining manufacturing properties and improving filterability for semiconductor applications
Solution Approach 2:
The patent extracts and removes the harmful sulfur impurities from the dihydroxynaphthalene resin through purification processes. By taking out the sulfur content to achieve 100 ppm or less, the resin maintains its beneficial filling and planarizing properties while eliminating the soft particle generation that causes filter clogging
2Reliability
If precise filtration is performed to remove soft particles, then filterability improves, but filter openings must be very small (20 nm or less) causing frequent clogging and reduced productivity
Solution Approach 1:
The patent applies preliminary action by purifying the dihydroxynaphthalene resin in advance to reduce sulfur content to 100 ppm or less before the filtration step. This preliminary purification prevents soft particle generation during filtration, allowing use of larger filter openings (20 nm or less) without frequent clogging, thereby improving both filterability and productivity
3Reliability
If sulfur content is reduced to 100 ppm or less, then soft particle generation is suppressed, but the production process becomes more complex requiring additional purification steps
Solution Approach 1:
The patent uses parameter changes by setting a specific threshold (100 ppm or less sulfur content) that balances purification complexity with soft particle suppression. This parameter specification enables manufacturers to achieve reliable soft particle suppression while controlling production process complexity through targeted purification to this defined level
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method produces a dihydroxynaphthalene condensate that effectively prevents soft particle formation, ensuring high filterability and reducing defects in semiconductor manufacturing, thereby improving the yield and quality of semiconductor devices.
Implementation Method 1
the dihydroxynaphthalene and a condensation agent are condensed in presence of an acid or a base to produce the dihydroxynaphthalene condensate
Data Source
AI summary
The invention provides: a dihydroxynaphthalene condensate which suppresses soft particle generation and is suitably usable for a composition excellent in filterability; and a method for producing the dihydroxynaphthalene condensate. In the method for producing a dihydroxynaphthalene condensate, dihydroxynaphthalene to be used has a sulfur element content of 100 ppm or less in terms of mass among constituent elements. The dihydroxynaphthalene and a condensation agent are condensed in presence of an acid or a base to produce the dihydroxynaphthalene condensate.