Diopter Adjusting Optical System for Spherical Aberration Correction

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Solution Overview

Problem

In laser machining and microscopy, spherical aberrations occur when the focal point is changed inside a medium, affecting the condensing performance and resolution of objective lenses, and existing methods struggle to maintain these at a diffraction limit.

Innovation Solution

A spherical aberration adjustment method for objective optical systems, involving a diopter adjusting optical system that changes the emittance or convergence of laser light, with varying positive and negative powers based on the distance from the medium's surface to the focal point, while keeping the focal point depth within a diffraction limit, using components like focal length variable lenses or spatial light modulators.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Length of moving object

If the focal point is changed inside the medium, then the machining depth or observation depth can be adjusted, but spherical aberration occurs that degrades condensing performance and resolution

Engineering Contradiction:

Improvefocal point depthVSAvoidcondensing performance and resolution

Core Design Contradiction:

Length of moving objectVSManufacturing precision

Solution Approach 1:

The patent employs a diopter adjusting optical system that dynamically changes the emittance or convergence of laser light based on the focal point depth. By varying the positive or negative power of the diopter adjusting optical system according to the distance from the medium surface to the focal point, the system maintains optimal condensing performance at different depths while correcting spherical aberration.

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The patent changes the optical parameters of the diopter adjusting optical system by varying its power (positive or negative) according to the focal point depth. This parameter adjustment compensates for spherical aberration that occurs when the focal point is moved inside the medium, thereby maintaining diffraction-limited resolution at different depths.

Inventive Principle:

Principle #35Parameter changes

2Manufacturing precision

If a spherical aberration adjusting mechanism is provided within the condenser lens, then spherical aberration due to medium thickness variation can be corrected, but the spherical aberration on the objective lens side is not resolved

Engineering Contradiction:

Improvespherical aberration correctionVSAvoidcomprehensive aberration correction coverage

Core Design Contradiction:

Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The patent introduces a diopter adjusting optical system that serves multiple functions: it corrects spherical aberration on both the condenser lens side and the objective lens side. This multi-functional approach comprehensively resolves spherical aberration issues throughout the entire optical path, unlike conventional mechanisms that only address one side.

Inventive Principle:

Principle #6Universality (Multi-functionality)

3Manufacturing precision

If the emittance or convergence of laser light is changed by the diopter adjusting optical system, then the focal point depth can be adjusted while maintaining diffraction limit, but the system complexity increases

Engineering Contradiction:

Improvediffraction limit maintenanceVSAvoidoptical system complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent introduces a diopter adjusting optical system as an intermediary component between the laser source and the objective lens. This intermediary system adjusts the emittance or convergence of laser light to compensate for spherical aberration and maintain diffraction-limited focus at different depths, adding controlled complexity to achieve superior performance.

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method allows for precise adjustment of the focal point depth within a medium, maintaining condensing performance and resolution at a diffraction limit, even with changes in medium thickness, and is applicable to both laser machining and microscopy.

Implementation Method 1

changing an emittance or convergence of a luminous flux of laser light by the diopter adjusting optical system, and changing a depth of a focal point inside the medium

Methodology Applied

Scientific EffectOptical refraction and focusing: Lens

Data Source

PatentUS20230125120A1Spherical aberration adjustment method for objective optical system, objective optical system and laser machining device

Publication Date: 2023.04.27 TOKYO SEIMITSU CO LTD

AI summary

A spherical aberration adjustment method for an objective optical system having an objective lens, and a diopter adjusting optical system arranged on an opposite side of a medium with respect to the objective lens, including changing an emittance or convergence of a luminous flux of laser light by the diopter adjusting optical system, and changing a depth of a focal point inside the medium with a diffraction limit of the objective optical system kept.