Direct Exposure Illuminance Control via Laser Array Adjustment
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Solution Overview
Problem
Existing direct exposure methods face challenges in achieving uniform illuminance distribution over the exposure target substrate, particularly when exposure conditions change, due to the limitations of using photomasks and two-dimensional arrays of laser diodes, which result in inefficiencies and increased production costs.
Innovation Solution
A direct exposure apparatus that measures the illuminance distribution and adjusts the light source output using a control system to achieve a uniform illuminance distribution, by controlling the light output of each laser diode based on measured data from a sensor array, ensuring consistent illumination across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photomasks are used for exposure, then wiring patterns can be transferred to substrates, but foreign matter and stains on the photomask cause defects and require strict management
Solution Approach 1:
The invention extracts and eliminates the photomask from the exposure system, replacing it with direct digital projection. This removes the source of foreign matter and stains that adhere to photomasks, thereby eliminating the harmful effects while maintaining wiring pattern transfer capability through direct laser exposure
Solution Approach 2:
The invention uses digital data to create a virtual copy of the wiring pattern that can be projected directly onto the substrate without physical contact. This digital copying approach replaces the physical photomask, eliminating contamination issues while preserving the pattern transfer function
2Manufacturing precision
If photomasks are used for exposure, then wiring patterns can be formed, but production cost and time increase due to repeated trial productions
Solution Approach 1:
The invention performs preliminary corrections for substrate expansion, shrinkage, distortion, and displacement at the exposure data generation stage rather than through repeated photomask trials. This advance preparation eliminates the need for multiple trial productions, reducing both time and cost while maintaining pattern accuracy
Solution Approach 2:
The invention replaces the mechanical photomask production and trial process with a digital data processing system. Corrections are made through software algorithms that adjust exposure data, eliminating the need for physical photomask iterations and significantly reducing production time
3Productivity
If laser diodes are arranged in a two-dimensional array for direct exposure, then illumination can be provided, but uniform illuminance distribution across the substrate is difficult to achieve
Solution Approach 1:
The invention applies local quality control by individually adjusting the output intensity of each laser diode in the array based on its position. Lasers at the edges emit less light than those at the center, creating a compensated illuminance distribution that achieves uniformity across the substrate surface
Solution Approach 2:
The invention changes the operating parameters of each laser diode based on its position in the array. By adjusting the drive current or pulse width of individual lasers, the system compensates for the natural fall-off in intensity at the edges, achieving uniform illuminance distribution across the exposure area
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for precise control of illuminance distribution, enhancing production accuracy, reducing production costs, and enabling flexible adjustments to exposure conditions, thereby improving the efficiency and quality of wiring formation on substrates.
Implementation Method 1
a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate
Implementation Method 2
the illuminance distribution of light projected from the light source onto the exposure target, i.e., the exposure target substrate, is measured
Implementation Method 3
the light source is controlled so that the intended illuminance distribution can be obtained
Data Source
AI summary
A direct exposure apparatus having a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate, comprises: measuring means for measuring the illuminance distribution of light on an area corresponding to the exposure surface of the exposure target substrate; and control means for controlling, based on the measurement result supplied from the measuring means, the light source so that the intended illuminance distribution can be obtained.