Directional Gas Diffuser Housing for Uniform Chamber Flow
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Solution Overview
Problem
Existing gas diffusers in semiconductor manufacturing systems fail to provide uniform and controlled gas flow, leading to potential disruption of contaminant particles and uneven distribution within enclosed chambers.
Innovation Solution
A directional gas diffuser with an elongate housing and varying channel dimensions, manufactured through additive manufacturing techniques, ensures uniform gas flow by controlling pressure and flow rate along the length of the diffuser, using a porous membrane to direct gas flow laterally and minimize particle disruption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If gas is introduced into the enclosed interior through a conventional diffuser, then the gas is introduced in a steady and diffused manner, but the gas flow is not uniform along the length of the diffuser, leading to uneven distribution and potential disruption of contaminant particles
Solution Approach 1:
The patent applies local quality by varying the channel dimensions (width and/or depth) at different locations along the length of the diffuser housing. This creates non-uniform flow resistance distributed along the channel, which compensates for the natural pressure gradient and achieves uniform gas flow distribution at the diffuser outlet, resolving the contradiction between flow uniformity and structural simplicity
Solution Approach 2:
The patent changes the geometric parameters of the channel (cross-sectional area, width, depth) along its length to control the flow characteristics. By progressively adjusting these parameters, the system achieves uniform gas distribution while maintaining a relatively simple single-piece housing structure, thus resolving the contradiction between flow uniformity and device complexity
2Manufacturing precision
If the channel cross-sectional area is reduced at locations closer to the closed end, then uniformity of flow through the diffuser outlet is improved, but the channel becomes more complex to manufacture
Solution Approach 1:
The patent merges the channel structure with the diffuser housing into a single integrated component. The channel is formed as an internal feature of the housing itself, eliminating the need for separate manifolds or complex assembly. This integration simplifies manufacturing while achieving the required variable cross-sectional area for uniform flow distribution
Solution Approach 2:
The patent utilizes additive manufacturing or similar fabrication techniques that can directly create complex three-dimensional geometries with varying cross-sectional areas. This manufacturing approach makes it feasible to produce the non-uniform channel geometry without significantly increasing manufacturing complexity, resolving the contradiction between flow uniformity and ease of manufacture
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The diffuser achieves uniform gas distribution within semiconductor processing chambers, reducing particle contamination and enhancing the evenness of gas contact with wafers, while allowing for precise control over flow properties.
Implementation Method 1
The diffuser introduces the gas into the interior of the transfer station in a steady and diffused manner
Implementation Method 2
using a porous membrane to direct gas flow laterally
Implementation Method 3
The channel can have varied dimensions along the length of the diffuser housing to improve uniformity of flow through the diffuser outlet
Data Source
AI summary
Described are directional gas diffuser devices and housing components thereof; systems that include the gas diffuser devices; methods of using the gas diffuser devices; and methods of manufacturing gas diffuser devices.