Display Device Acid Etching to Prevent Yttrium Redeposition Defects
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Solution Overview
Problem
The redeposition of materials during dry etching processes in display device manufacturing leads to defects, especially as pixel sizes decrease, requiring improved precision to reduce inferiority rates.
Innovation Solution
A manufacturing method that includes an additional acid etching process using etching solutions of hydrochloric acid, sulfuric acid, or nitric acid to remove yttrium compounds formed during dry etching, before forming photoresist patterns, thereby preventing defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If dry etching process is used to form layer patterns, then manufacturing efficiency is improved, but material redeposition occurs causing defects
Solution Approach 1:
The patent applies preliminary action by performing an additional acid etching process before the photoresist pattern formation step. This preliminary acid etching removes yttrium compounds that were redeposited during the dry etching process, preventing them from causing defects in subsequent exposure and etching steps. The acid etching is performed as a preparatory action to clean the surface before the next critical process.
2Illumination intensity
If pixel size is reduced to improve display resolution, then display quality is improved, but manufacturing precision requirements increase
Solution Approach 1:
The patent converts the harmful effect of material redeposition during dry etching into a beneficial process by introducing acid etching steps. The acid etching process specifically targets and removes yttrium compounds that cause defects, transforming a harmful redeposition issue into a controlled cleaning process that improves manufacturing precision for smaller pixel structures.
3Reliability
If additional acid etching process is added to remove yttrium compounds, then defect prevention is improved, but process complexity increases
Solution Approach 1:
The patent merges the acid etching process with existing process steps in the manufacturing flow. The additional acid etching is integrated at specific points where defect prevention is most critical, combining multiple functions (cleaning, defect removal, and process control) into a unified manufacturing sequence rather than adding completely separate complex subsystems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively removes yttrium compounds, preventing defects and ensuring precise manufacturing of display devices by minimizing redeposition issues.
Implementation Method 1
performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid
Implementation Method 2
forming a first layer pattern by dry etching on a substrate
Implementation Method 3
forming a photoresist pattern on the second layer material
Data Source
AI summary
A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.