Multi-Layer Insulating Structure for Display Active Switches
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Solution Overview
Problem
Conventional methods for improving the insulation layer in active switches for displays lead to decreased interface quality and increased current leakage, affecting the reliability and performance of the switches.
Innovation Solution
A display panel with active switches featuring an insulating layer composed of multiple thin film layers formed by chemical vapor deposition, specifically two or three layers with predetermined thicknesses and deposition rates, to enhance the interface quality with amorphous silicon layers and improve the uniformity and reliability of the active switches.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional methods are used to improve the insulation layer, then the insulation performance is enhanced, but the interface quality decreases and current leakage increases
Solution Approach 1:
The insulation layer is divided into multiple thin film layers (first insulating thin film layer and second insulating thin film layer) with different thicknesses. The first layer has thickness of 500-2000 Å and the second layer has thickness of 2000-3500 Å, creating a segmented structure that improves both insulation performance and interface quality simultaneously
Solution Approach 2:
Different regions of the insulation layer have different thicknesses to optimize local properties. The first insulating thin film layer is thinner (500-2000 Å) while the second insulating thin film layer is thicker (2000-3500 Å), creating local quality variations that enhance overall reliability without compromising interface quality
2Reliability
If the insulation layer thickness is increased to improve insulation, then the insulation performance improves, but the deposition time increases
Solution Approach 1:
The total insulation layer thickness is segmented into two separate deposition processes. The first layer (500-2000 Å) and second layer (2000-3500 Å) are deposited in sequence, allowing optimization of deposition parameters for each layer and improving overall deposition efficiency while maintaining total thickness for insulation performance
Solution Approach 2:
The deposition parameters are changed between forming the first and second insulating thin film layers. By adjusting deposition conditions for each layer, the overall deposition rate is improved while achieving the required total thickness for insulation performance
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The multi-layer insulating structure improves the interface quality and reliability of the active switches, leading to better performance and faster deposition rates in display panels.
Implementation Method 1
the thin film layers are formed by chemical vapor deposition process with a predetermined thickness
Data Source
AI summary
The present application discloses a display panel and a display device apparatus. The display panel includes a substrate, the substrate includes a plurality of pixel regions; an active switch, a plurality of active switches disposed on the substrate, wherein the pixel regions are disposed on the active switches, the active switches are corresponding to each of the pixel regions, respectively, and each of the active switch includes: an insulating layer, the insulating layer includes at least two thin film layers, the thin film layers are formed by chemical vapor deposition process with a predetermined thickness.