Dual-Sided Alignment Marks for Display Substrate Overlay Accuracy

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Solution Overview

Problem

In the manufacturing of display substrates, achieving accurate alignment between the front and back surfaces is challenging due to process variations, which affects signal connectivity and bezel reduction in display devices.

Innovation Solution

An alignment mark system is introduced, comprising a first alignment marker on the front surface and a second alignment marker on the back surface, with specific patterns and displacement value markers to represent process variations, allowing for direct observation and correction of alignment accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional alignment methods are used without specific alignment markers, then the manufacturing process is simpler, but the alignment precision between front and back surfaces deteriorates

Engineering Contradiction:
Improvealignment precisionVSAvoidalignment mark system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent introduces alignment markers as intermediary elements that mediate between the front and back surfaces of the substrate. These markers serve as reference points that enable precise alignment measurement and correction without requiring complex direct measurement systems between the two surfaces.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The alignment markers are formed by copying patterns from the front surface to the back surface through the substrate. This copying process creates corresponding reference points on both surfaces that can be used to detect and correct alignment variations, thereby improving alignment precision while maintaining a relatively simple manufacturing process.

Inventive Principle:
Principle #26Copying

2Measurement precision

If alignment markers are introduced to detect process variations, then the alignment accuracy improves, but the manufacturing process complexity increases

Engineering Contradiction:
Improveprocess variation detection precisionVSAvoidalignment mark structure
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The alignment mark system is segmented into multiple functional components: first alignment markers on the front surface, second alignment markers on the back surface, and displacement value markers for measurement. This segmentation allows each component to perform its specific function efficiently, improving measurement precision while keeping the overall system manageable.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent utilizes different visual characteristics (analogous to color changes) of the alignment markers to represent different alignment states and process variations. The displacement value markers provide visual feedback about alignment accuracy, enabling precise measurement without requiring complex electronic measurement systems.

Inventive Principle:
Principle #32Color changes

3Reliability

If accurate alignment is achieved through process correction, then signal connectivity improves, but the correction process time increases

Engineering Contradiction:
Improvesignal connectivityVSAvoidalignment correction time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The alignment markers are formed in advance during the substrate manufacturing process, before the actual alignment and assembly operations. This preliminary action allows for pre-detection of alignment variations and enables corrective measures to be planned and executed more efficiently, reducing the time required for alignment correction while ensuring reliable signal connectivity.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS11994810B2Alignment mark, mask and display substrate motherboard
Publication Date: 2024.05.28 BOE TECHNOLOGY GROUP CO LTD
  • US11994810B2 patent drawing
  • US11994810B2 patent drawing
  • US11994810B2 patent drawing

AI summary

An alignment mark includes a first alignment marker located on a first surface of a substrate and a second alignment marker located on a second surface of the substrate. The second alignment marker is arranged to be matched with the first alignment marker, and capable of representing a process variation between the second alignment marker and the first alignment marker.