Display Device Auxiliary Data Pattern Photomask Reduction
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Solution Overview
Problem
Existing display device manufacturing processes face challenges in reducing electrical and physical characteristic deterioration while minimizing the number of photomasks used, leading to increased costs and inefficiencies.
Innovation Solution
The display device design incorporates a substrate with a data line, insulating layers, transistors, and a pixel electrode, along with auxiliary data patterns and connecting members, all formed using a reduced number of photomasks, including a light blocking layer and multi-layer conductive structures like titanium/copper/titanium/silver/transparent conductive oxide, to enhance electrical connectivity and reduce physical stress.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple photomasks are used to pattern each layer, then manufacturing precision is maintained, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent combines the patterning of multiple layers (data line, pixel electrode, auxiliary data pattern) into a single photolithography process using one photomask. The conductive pattern is formed in the third insulating layer with openings that simultaneously define the data line, pixel electrode, and auxiliary data pattern, eliminating the need for separate photomasks for each layer.
Solution Approach 2:
The single photomask serves multiple functions by patterning different conductive elements (data line, pixel electrode, auxiliary data pattern) in different layers simultaneously. The auxiliary data pattern layer also serves as a grounding layer and electrical connection path, making it a multi-functional structural element.
2Ease of manufacture
If the number of photomasks is reduced, then manufacturing cost decreases, but electrical and physical characteristic deterioration occurs
Solution Approach 1:
The auxiliary data pattern acts as an intermediary element that provides electrical connection paths and grounding between different conductive elements (data line, pixel electrode, transistors). This intermediary structure enables the reduced photomask design to maintain proper electrical connectivity without compromising device reliability.
Solution Approach 2:
The patent uses vertical stacking of conductive patterns across multiple insulating layers to achieve electrical connectivity that would be difficult to achieve in a single layer. The data line in the first insulating layer connects to the pixel electrode through the auxiliary data pattern in the third insulating layer, utilizing the third dimension (depth/layers) to solve connectivity challenges.
3Reliability
If auxiliary data pattern is added to enhance connectivity, then electrical connectivity improves, but device complexity increases
Solution Approach 1:
The auxiliary data pattern is merged with the pixel electrode layer formation process. Both the pixel electrode and auxiliary data pattern are formed in the same photolithography step using the same photomask, so the auxiliary pattern does not add separate manufacturing steps or complexity, only structural elements.
Data Source
AI summary
A display device includes: a substrate; a data line on the substrate; a first insulating layer on the data line; a first transistor on the first insulating layer; a second insulating layer on the first transistor; a pixel electrode on the second insulating layer, the pixel electrode being electrically connected to the first transistor; and an auxiliary data pattern on the second insulating layer as a same layer as the pixel electrode, the auxiliary data pattern being electrically connected to the data line.