Display Device Bank Layer Conductive Material Photo Patterning
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing display devices face challenges in achieving high-resolution displays due to the need for narrow spacing between light emitting elements, which complicates the fabrication process and requires advanced mask processes.
Innovation Solution
A display device is fabricated using a photo pattern process without a mask, forming light emitting elements on a substrate with a bank layer containing conductive material, and encapsulation layers made of inorganic and organic materials, allowing for precise formation of individual pixels and electrical connections.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If high pixel integration density is required for high-resolution display, then the spacing between light emitting elements must be narrowed, but the fabrication process becomes more complex and requires advanced mask processes
Solution Approach 1:
The patent extracts and removes the mask layer from the fabrication process. By using a photo pattern process without a mask, the invention eliminates the complexity associated with mask alignment and processing while maintaining high pixel formation precision through direct photo patterning of the light emitting element layers
Solution Approach 2:
The patent replaces the mechanical mask-based patterning system with a photochemical patterning system. Instead of using physical masks that require precise mechanical alignment, the invention uses photoresist materials that are patterned through light exposure, substituting mechanical processes with optical-chemical processes that are inherently more precise and less complex
2Manufacturing precision
If narrow spacing between light emitting elements is implemented, then high-resolution display is achieved, but fabrication difficulty increases
Solution Approach 1:
The patent removes the mask layer that complicates fabrication, enabling direct photo patterning of light emitting elements with narrow spacing. This extraction of the mask component simplifies the manufacturing process while maintaining the ability to achieve precise narrow spacing through photoresist patterning
Solution Approach 2:
The patent changes the fabrication approach from mechanical mask-based patterning to photochemical patterning. By altering the fundamental parameter of how patterns are transferred (from mechanical to photochemical), the invention achieves both narrow spacing precision and manufacturing ease through the self-aligning nature of photoresist processes
Data Source
AI summary
A display device includes: a substrate comprising an emission area and a non-emission area; a first light emitting element on the emission area of the substrate; a pixel defining layer on the non-emission area of the substrate and defining a first opening; a bank layer on the pixel defining layer, defining a second opening, and containing a conductive material; a first encapsulation layer on the first light emitting element and containing an inorganic material; and a second encapsulation layer on the first encapsulation layer and containing an organic material, wherein a cavity is formed between the first encapsulation layer and the bank layer in a direction perpendicular to the substrate, the cavity overlaps the emission area and the non-emission area, and the cavity is filled by the second encapsulation layer.