Display Device Base Layer Segmentation for Bezel Reduction

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Solution Overview

Problem

The existing methods for manufacturing large-screen display devices with tiled displays face challenges in reducing the bezel width, as forming contact holes in glass substrates is time-consuming and decreases yield due to process difficulties.

Innovation Solution

A display device with a base layer structure that includes a first base layer, an etch stop layer, second lines, and a second base layer, where first lines are electrically connected to the second lines through first contact holes, and the etch stop layer includes doping areas for efficient signal line connection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If contact holes are formed in a glass substrate base layer, then signal lines can be connected through the base layer, but the processing time increases and yield decreases due to process difficulties

Engineering Contradiction:
Improvesignal line connectionVSAvoidprocessing time and yield
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The base layer is segmented into a first base layer and a second base layer with an etch stop layer in between. This segmentation allows contact holes to be formed more efficiently in the first base layer without the need to drill through the entire glass substrate thickness, thereby reducing processing time and improving yield while maintaining signal line connection reliability.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

An etch stop layer is introduced as an intermediary between the first and second base layers. This etch stop layer facilitates controlled etching processes, enabling precise formation of contact holes in the first base layer while preventing excessive etching into the second base layer, thus improving manufacturing efficiency and yield.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Length of moving object

If the bezel width is reduced by forming contact holes in the display area, then display quality improves, but the complexity of forming contact holes in glass substrate increases

Engineering Contradiction:
Improvebezel widthVSAvoidcontact hole formation complexity
Core Design Contradiction:
Length of moving objectVSDevice complexity

Solution Approach 1:

By dividing the base layer into two separate layers with an etch stop layer, the structure enables contact holes to be formed in the display area with reduced bezel width while managing the complexity through staged manufacturing processes rather than attempting to drill through the entire glass substrate in one step.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for efficient formation of contact holes in the display device, reducing processing time and improving yield, while also minimizing the bezel width and enhancing display quality.

Implementation Method 1

the etch stop layer may include a semiconductor material, and the doping areas may include a conductive material... the etch stop layer may include amorphous silicon, and the doping areas may be doped with boron

Methodology Applied
Scientific EffectDoping: Dopants

Data Source

PatentUS12268068B2Display device and method for manufacturing the same
Publication Date: 2025.04.01 SAMSUNG DISPLAY CO LTD
  • US12268068B2 patent drawing
  • US12268068B2 patent drawing
  • US12268068B2 patent drawing

AI summary

A display device includes: a base layer including a first surface, and a second surface; a plurality of pixels on the first surface; and a plurality of first lines on the first surface. The base layer includes: a first base layer; an etch stop layer on the first base layer; a plurality of second lines on the etch stop layer; and a second base layer on the etch stop layer and the second lines. The first base layer, the etch stop layer, the second lines, and the second base layer are sequentially stacked, and the first lines are electrically connected to the second lines through first contact holes.