Display Apparatus Dummy Pattern Reflectance Compensation
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Solution Overview
Problem
Modern display apparatuses face issues with inconsistent reflection across different areas, leading to degradation in display quality due to thickness differences in the organic layer caused by the reflow phenomenon during its formation.
Innovation Solution
A display apparatus design that includes a dummy pattern around the via hole in the edge area, with varying sizes and depths of the dummy pattern to compensate for reflectance deviations, allowing for uniform reflectance without additional processing steps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the organic layer is formed by reflow phenomenon, then the organic layer is automatically planarized, but thickness differences occur between middle area and edge area causing reflectance inconsistency
Solution Approach 1:
The patent introduces a dummy pattern specifically in the edge area (but not in the middle area) to create local structural differences. This dummy pattern compensates for the thickness variation caused by the reflow phenomenon, making the edge area have equivalent optical path length to the middle area, thereby achieving uniform reflectance across different regions.
Solution Approach 2:
The patent modifies the structural parameters (presence/absence, size, depth) of the dummy pattern in different areas to compensate for the thickness variation. By changing the physical parameters of the dummy pattern, the optical path length is adjusted to achieve consistent reflectance characteristics across the display area.
2Manufacturing precision
If uniform reflectance is achieved by adjusting organic layer thickness, then additional processing steps are required, but process complexity increases
Solution Approach 1:
The dummy pattern is formed using the same patterning process (photolithography) as the existing via holes, reusing the existing photoresist coating and etching steps. This allows the dummy pattern to be created without introducing entirely new processing equipment or methods, thereby limiting the increase in process complexity.
Solution Approach 2:
The formation of the dummy pattern is merged with the existing via hole formation process. Both structures are defined in the same photolithography step and etched through the same insulation layer using the same etching conditions, thereby combining multiple functions into a single integrated process flow.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively compensates for reflectance differences between the middle and edge areas, enhancing display quality by adjusting the size and depth of the dummy pattern to match the thickness variation of the organic layer, thereby achieving consistent reflectance across the display area.
Implementation Method 1
a first thickness of the organic layer in the middle area may be greater than a second thickness of the organic layer in the edge area
Data Source
AI summary
A display apparatus includes a first transistor, a first pixel electrode, a second transistor, and a second pixel electrode. The first transistor includes a first drain electrode. The first pixel electrode is positioned between an edge of the display apparatus and a center of the display apparatus and includes a first recessed structure. The first recessed structure directly contacts the first drain electrode. The second transistor includes a second drain electrode. The second pixel electrode is positioned between the edge of the display apparatus and the first pixel electrode and includes at least one recessed structure. The at least one recessed structure includes a second recessed structure. The second recessed structure directly contacts the second drain electrode. A total maximum width of the at least one recessed structure is greater than a maximum width of the first recessed structure.