Display Electrode Layout With Dummy Patterns for Contact Uniformity
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Solution Overview
Problem
Existing display devices face challenges in achieving uniformity of contact holes and electrodes in the display area, leading to potential defects and non-uniform lighting.
Innovation Solution
The display device incorporates a via layer and dummy pattern layers on the same layer, with dummy electrodes covering signal lines and light emitting elements, and a method of fabrication that includes forming electrodes and dummy electrodes through etching processes to enhance uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If dummy pattern layers are added in the non-display area, then uniformity of contact holes and electrodes is improved, but device complexity increases
Solution Approach 1:
The patent divides the electrode structure into two segments: functional electrodes in the display area and dummy electrodes in the non-display area. This segmentation allows the dummy electrodes to independently compensate for uniformity issues without affecting the functional electrodes, thereby improving contact hole and electrode uniformity while maintaining clear functional boundaries
Solution Approach 2:
The patent creates dummy pattern layers that replicate the structure and material composition of the via layer and electrode layer. By copying the same materials and formation processes, the dummy electrodes serve as reference structures that improve manufacturing uniformity across the substrate without requiring new materials or processes
2Ease of manufacture
If via layer and dummy pattern layers are formed on the same layer, then manufacturing process is simplified, but manufacturing precision may be compromised
Solution Approach 1:
The patent merges the formation of via layers and dummy pattern layers into a single etching process step. By combining these two operations into one process, the patent simplifies manufacturing while maintaining precision because both structures are created simultaneously under identical process conditions, ensuring consistent etching depth and uniformity
Solution Approach 2:
The patent creates equipotential process conditions by forming both via layers and dummy pattern layers in the same etching step. This ensures that both structures experience identical process parameters (temperature, pressure, chemistry), thereby maintaining manufacturing precision while simplifying the overall process
Data Source
AI summary
Provided herein is a display device and a method of fabricating the display device. The display device includes a substrate including a display area and a non-display area, a via layer disposed in the display area, electrodes disposed on the via layer and spaced apart from each other, light emitting elements disposed between the electrodes, dummy pattern layers disposed in the non-display area, and dummy electrodes disposed on the dummy pattern layers. The via layer and the dummy pattern layers may be disposed on a same layer. The electrodes and the dummy electrodes may be disposed on a same layer.


