Display Electrode CMP Patterning for Precise Alignment Line Division

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Solution Overview

Problem

Current display device manufacturing processes face challenges in achieving a stable and efficient formation of contact electrodes, particularly due to limitations in the process margin and alignment line division processes, which can lead to inefficiencies and additional mask requirements.

Innovation Solution

The use of chemical mechanical polishing (CMP) to form contact electrodes, where a photoresist pattern is created using the contact electrode material layer as a polishing stopper, allowing for the stable division of the contact electrode material layer into first and second contact electrodes, and the incorporation of a height difference compensation pattern to facilitate alignment line division without additional mask processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional methods are used to form contact electrodes, then the manufacturing process is simpler, but the process margin is insufficient and alignment precision deteriorates

Engineering Contradiction:

Improveprocess margin for forming contact electrodesVSAvoidcomplexity of contact electrode formation process

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The contact electrode material layer is formed preliminarily before the alignment line division process. By preparing the contact electrode material layer in advance and using it as a polishing stopper during CMP, the process margin is improved without requiring additional mask processes later.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The contact electrode material layer serves as an intermediary element with different polishing rates. This intermediary layer enables precise alignment line division by acting as a polishing stopper during CMP, allowing the upper surface of the alignment line to be exposed at the desired position without additional masks.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Manufacturing precision

If additional mask processes are used for alignment line division, then alignment precision improves, but manufacturing efficiency deteriorates and process time increases

Engineering Contradiction:

Improvealignment line division precisionVSAvoidmanufacturing efficiency

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

The need for additional mask processes is extracted and eliminated. By using the contact electrode material layer as a polishing stopper during CMP, the alignment line division is achieved without requiring separate mask layers, thereby improving manufacturing efficiency while maintaining precision.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The contact electrode material layer performs multiple functions: it serves as both the contact electrode material and the polishing stopper for alignment line division. This multi-functionality eliminates the need for separate mask processes, improving both precision and productivity.

Inventive Principle:

Principle #6Universality (Multi-functionality)

3Productivity

If CMP is used to form contact electrodes, then process margin and manufacturing efficiency improve, but the process requires additional polishing steps

Engineering Contradiction:

Improvemanufacturing efficiencyVSAvoidnumber of process steps

Core Design Contradiction:

ProductivityVSDevice complexity

Solution Approach 1:

The contact electrode formation and alignment line division processes are merged into a single CMP step. By using the contact electrode material layer as a polishing stopper, both the contact electrode patterning and the alignment line exposure are achieved simultaneously, improving manufacturing efficiency without significantly increasing process complexity.

Inventive Principle:

Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach improves the process margin for forming contact electrodes, enhances manufacturing efficiency, and eliminates the need for additional mask processes during alignment line division, resulting in a more reliable and efficient display device fabrication.

Implementation Method 1

chemical mechanical polishing (CMP) to expose part of the contact electrode material layer

Methodology Applied

Scientific EffectChemical mechanical polishing:

Data Source

PatentUS20250105233A1Display device and method of fabricating the same

Publication Date: 2025.03.27 SAMSUNG DISPLAY CO LTD

AI summary

A display device and a method of fabricating a display device. The display device includes a substrate including an emission area and a subarea adjacent to the emission area, a bank disposed in the emission area of the substrate, a height difference compensation pattern disposed in the subarea of the substrate, a first electrode and a second electrode that are disposed on the bank, the first electrode and the second electrode being spaced apart from each other, and a light-emitting element disposed in the emission area, between the first electrode and the second electrode.