Display Device Manufacturing Using Etch Stop Patterns
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Solution Overview
Problem
Existing manufacturing methods for display devices in tiled displays are inefficient, particularly in the process of forming holes and patterns on substrates, which often require multiple steps and can lead to increased costs and reduced precision.
Innovation Solution
A manufacturing method for display devices that involves preparing a substrate with a metal pattern and defined areas, forming specific active patterns and gate electrode patterns, and using an etch stop pattern to control etching, thereby simplifying the process and improving efficiency by omitting the need for a photo process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If traditional manufacturing methods are used to form holes and patterns on substrates, then the display device can be manufactured, but the manufacturing process requires multiple steps including photo processes, leading to reduced efficiency and increased cost
Solution Approach 1:
The patent extracts and removes the photo process step from the traditional manufacturing sequence by using direct etching methods with etch stop patterns to define boundaries, eliminating an entire process category while maintaining pattern definition capability
Solution Approach 2:
The etch stop pattern is formed in advance before the actual etching of holes and patterns, pre-defining the boundaries and stopping points for subsequent etching operations, which streamlines the overall manufacturing sequence
2Manufacturing precision
If multiple photo processes are used to define patterns and holes, then precise patterns can be formed, but the manufacturing cost and process time increase
Solution Approach 1:
The patent combines multiple pattern definition functions into a single etch stop pattern layer that serves as both a boundary definition and an etching stop reference, allowing multiple holes and patterns to be formed simultaneously without sequential photo processes
Solution Approach 2:
The etch stop pattern acts as an intermediary layer that mediates between the substrate and the etching process, providing precise stopping points and boundaries for hole formation without requiring photo resist materials or photo lithography equipment
3Ease of manufacture
If traditional multi-step processes are used, then all necessary patterns and holes can be formed, but the manufacturing cost increases due to multiple photo processes and materials
Solution Approach 1:
The patent removes photo resist materials, photo lithography chemicals, and associated processing equipment from the manufacturing system, replacing them with direct etching methods that use fewer material types and reduce chemical waste
Solution Approach 2:
The etch stop pattern serves multiple functions simultaneously: it defines hole boundaries, provides etching stop references, and establishes pattern geometries, replacing what would traditionally require multiple specialized layers and processes
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enhances manufacturing process efficiency by reducing the number of steps required and potentially lowering costs, while also improving the precision and quality of the display devices produced.
Implementation Method 1
an etch rate of the first insulating layer, an etch rate of the second insulating layer, and an etch rate of the inter-insulating layer may be smaller than an etch rate of the etch stop pattern
Data Source
AI summary
A manufacturing method of a display device includes preparing a substrate including a metal pattern, forming a first active pattern disposed on the substrate and including first and second areas and a first channel area between the first and second areas, forming a first gate electrode pattern on the first active pattern, forming a second active pattern on the first gate electrode pattern, forming an etch stop pattern overlapping the first and second areas, forming an inter-insulating layer covering the etch stop pattern, defining a first hole exposing the etch stop pattern and a second hole exposing the inter-insulating layer, defining a third hole exposing a top surface of the substrate, defining a fourth hole penetrating the etch stop pattern and a fifth hole exposing the metal pattern, forming a metal pattern connection electrode on the metal pattern, and forming a light-emitting device on the metal pattern connection electrode.