Display Substrate Laser Etching With Measured Two-Step Alignment
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Solution Overview
Problem
Existing display apparatus manufacturing processes face challenges in achieving precise and efficient laser drilling of organic functional layers, leading to suboptimal alignment and etching of display substrates, which affects the overall quality and workability of the display apparatus.
Innovation Solution
A manufacturing apparatus and method that includes a movable portion with a display substrate, a laser processor, and a measurement unit to align and adjust laser parameters for precise etching of organic functional layers, utilizing a pattern part with dummy electrodes and alignment keys for improved accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional manufacturing methods are used for processing organic functional layers, then the manufacturing process is simpler, but the precision and quality of etching patterns deteriorates
Solution Approach 1:
The patent applies preliminary action by performing a first laser irradiation process to create initial etching patterns on the organic functional layer before final etching. This preliminary etching establishes a foundation that improves subsequent etching precision, allowing the complex multi-step process to achieve superior results that would be impossible with conventional single-step methods
Solution Approach 2:
The patent implements feedback by using a measurement unit to detect the etching depth and characteristics of the organic functional layer after the first laser irradiation, then using this measured information to control the second laser irradiation process. This closed-loop feedback system continuously adjusts laser parameters based on actual etching results, thereby improving manufacturing precision through iterative optimization
2Manufacturing precision
If a single laser irradiation process is used, then the manufacturing process is faster, but the alignment precision of patterns deteriorates
Solution Approach 1:
The patent segments the laser irradiation process into two distinct stages: a first irradiation process that creates initial etching patterns for alignment reference, and a second irradiation process that completes the final etching. This segmentation allows each stage to be optimized independently, with the first stage focusing on alignment precision and the second stage on final pattern quality, thereby achieving high precision without excessive time loss
Solution Approach 2:
The first laser irradiation process serves as a preliminary action that creates etching patterns which function as alignment references for subsequent processing steps. These pre-created patterns enable precise alignment of the second irradiation process, effectively reducing alignment time and improving overall alignment precision compared to attempting to achieve both alignment and final etching in a single step
3Adaptability or versatility
If fixed laser parameters are used for etching, then the process control is simpler, but the adaptability to different pattern requirements deteriorates
Solution Approach 1:
The patent applies dynamics by implementing a control system that dynamically adjusts laser parameters (such as power, pulse duration, and scanning speed) based on real-time measurement feedback from the etching process. This dynamic parameter adjustment allows the system to adapt to different pattern requirements, material variations, and etching depths, transforming a static fixed-parameter process into a flexible adaptive process that can handle diverse manufacturing requirements
Solution Approach 2:
The patent utilizes parameter changes by systematically varying laser irradiation parameters including power density, pulse width, scanning speed, and wavelength based on measurement feedback and specific pattern requirements. This parameter optimization approach enables the etching process to adapt to different organic functional layer materials, thicknesses, and desired etching depths, thereby improving versatility while the automated control system manages the complexity of multiple parameter adjustments
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances the precision and efficiency of laser drilling, improving the alignment and etching process, thereby increasing the workability and quality of display apparatus manufacturing.
Implementation Method 1
a processor to cause a laser to irradiate the display substrate in a first irradiating process... irradiate a laser to the organic functional layer located on the dummy electrode
Implementation Method 2
a measurement unit configured to measure the display substrate to which the laser has irradiated in the first irradiating process... measure an etched position, shape, and depth of the at least a part of the organic functional layer
Data Source
AI summary
An apparatus for manufacturing a display apparatus includes a movable portion to which a display substrate including a pattern part is attached, wherein the pattern part includes a dummy electrode and an organic functional layer covering the dummy electrode, a processor configured to cause a laser to irradiate the display substrate in a first irradiating process, a measurement unit configured to measure the display substrate to which the laser has irradiated in the first irradiating process, and a controller configured to receive data measured by the measurement unit and control the processor to cause the laser to irradiate the laser in a second irradiating process using at least one different parameter than what was used in the first irradiating process.