Display Device Mask Layer Etching for High Resolution
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Solution Overview
Problem
Existing display devices face challenges in achieving high luminance, high resolution, high definition, and high reliability, particularly in applications such as virtual reality and augmented reality, where traditional manufacturing methods using metal masks result in low yield and reliability due to inaccuracies and damage to light-emitting layers.
Innovation Solution
A manufacturing method that employs photolithography without a shadow mask to form island-shaped light-emitting layers for each subpixel, using mask layers and insulating films to protect the light-emitting layers, and etching treatments to create a tapered shape, ensuring precise alignment and reduced damage, thereby enhancing the reliability and resolution of the display device.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If metal masks are used in the manufacturing process, then alignment and patterning can be achieved, but the light-emitting layers are damaged and yield is reduced
Solution Approach 1:
The patent introduces mask layers (first mask layer 118B, second mask layer 118G, third mask layer 118R) as intermediary protective structures that are formed over the light-emitting layers before etching. These mask layers prevent direct contact between the etching process and the light-emitting layers, thereby avoiding damage while still enabling precise patterning through subsequent etching of the mask layers themselves.
Solution Approach 2:
The patent forms protective insulating films (first insulating film 125, second insulating film 127) and mask layers before the etching process. This preliminary formation of protective structures ensures that the light-emitting layers are already protected before any etching treatment is applied, preventing damage during the manufacturing process.
2Ease of manufacture
If traditional manufacturing methods are used, then production can proceed with existing processes, but resolution and definition are limited
Solution Approach 1:
The patent divides the manufacturing process into multiple sequential steps with distinct functions: forming light-emitting layers, forming protective insulating films, forming multiple mask layers, performing etching treatments, and removing masks. This segmentation allows each step to be optimized for its specific purpose, achieving high resolution through precise etching while maintaining ease of manufacture through standardized process modules.
Solution Approach 2:
The patent adds vertical dimensionality by forming stacked layers (insulating films and mask layers) above the light-emitting layers. This multi-layer structure enables precise patterning through etching of the upper layers without affecting the light-emitting layers below, thereby achieving high resolution while maintaining manufacturing simplicity.
3Manufacturing precision
If mask layers are removed completely, then the light-emitting layers are exposed, but manufacturing yield decreases
Solution Approach 1:
The patent forms protective insulating films and multiple mask layers as cushioning structures before the etching process. These structures absorb the mechanical and chemical stress of etching, preventing damage to the light-emitting layers. The protective structures are designed to be removed after etching, having served their protective function during the critical patterning step.
4Illumination intensity
If aperture ratio is increased for high luminance, then light emission is improved, but manufacturing complexity increases
Solution Approach 1:
The patent extracts and removes the protective mask layers (first mask layer 118B, second mask layer 118G, third mask layer 118R) and insulating films after they have served their protective function during etching. This removal eliminates the need for complex integrated structures, allowing for simpler final device design while maintaining the benefits of the protective structures during manufacturing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enables the production of high-luminance, high-resolution, and highly reliable display devices with improved aperture ratio and reduced manufacturing defects, leading to increased lifetime and efficiency.
Implementation Method 1
first etching treatment is performed to remove part of the first insulating film that is not covered with the resist mask and to thin down part of the first mask layer and part of the second mask layer
Implementation Method 2
heat treatment is performed, followed by second etching treatment using the second insulating layer as a mask
Data Source
AI summary
A display device capable of performing display at high luminance is provided. After a first layer including a first light-emitting material emitting blue light is formed into an island shape over a first pixel electrode, a second layer including a second light-emitting material emitting light with a longer wavelength than blue light is formed into an island shape over a second pixel electrode. Then, an insulating layer overlapping with a region interposed between the first pixel electrode and the second pixel electrode is formed, and a common electrode is formed to cover the first layer, the second layer, and the insulating layer. The insulating layer is formed by performing patterning treatment and etching treatment at least twice.