Display Pad Barrier Structure for Plasma Etch Damage Prevention

The patent applies preliminary action by forming a protective barrier layer structure before the plasma etching process. The barrier layer is deposited on the rear surface of the upper base layer to cover and protect the pads during the manufacturing process, specifically during plasma etching with nitrogen trifluoride gas. This pre-protective measure prevents pad damage before the harmful etching process occurs.

The barrier layer acts as an intermediary between the pads and the plasma etching process. It is a protective intermediate structure that allows the plasma etching to proceed while preventing direct contact between the harmful plasma and the pad structures, thus mediating the interaction to prevent damage.

The barrier layer is segmented into multiple distinct layers with different functions. The first barrier layer is adjacent to and covers the pad structure, while the second barrier layer is disposed between the upper and lower base layers. This segmentation allows each layer to be optimized for its specific protective function while maintaining overall structural organization.

The barrier layer structure exhibits local quality by providing enhanced protection specifically where needed - adjacent to the pads and at the interface between base layers. The barrier layer is not uniformly distributed throughout the entire device but is strategically positioned to protect critical areas, making the protection efficient and targeted rather than redundant throughout the whole structure.