Display Panel Insulating Film Cutoff for Maskless Etching

The patent applies the self-service principle by making the insulating film serve dual purposes: both as a functional insulating layer and as a mask for etching adjacent film layers. The insulating film is extended into the non-display region and patterned to act as its own masking structure, eliminating the need for separate mask layers. This self-service approach reduces process complexity while maintaining manufacturing precision.

The insulating film is designed to perform multiple functions: providing electrical insulation, serving as an etch mask for adjacent layers, and defining pattern boundaries. By making the insulating film multi-functional, the patent eliminates the need for separate mask exposure steps, thereby reducing device complexity and manufacturing cost while maintaining precision.

The insulating film serves as its own mask, eliminating the need for separate mask exposure steps. This self-service mechanism reduces the number of processing steps required, thereby improving productivity and production capacity while maintaining the necessary manufacturing precision through the integrated design.

The patent merges the insulating film formation step with the mask creation step into a single integrated process. By combining these two functions into one step, the overall process time is reduced, improving productivity without sacrificing the precision needed for film layer formation.

The insulating film serves as its own etch mask, eliminating the need for specialized mask materials and processes. This self-service approach reduces manufacturing cost by removing the need for additional mask layer deposition and removal steps, while maintaining etching precision through the insulating film's inherent pattern definition capabilities.

The patent extracts the mask function from separate specialized mask layers and integrates it into the insulating film itself. This extraction eliminates the need for additional mask materials and processing steps, reducing manufacturing cost while preserving etching precision through the insulating film's patterned structure.