Display Panel Residue Trace Layout for Narrow Bezel Manufacturing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The challenge is to minimize the width of the non-display area in display devices while improving process efficiency and yield during manufacturing.
Innovation Solution
The display device incorporates a display panel with a conductive layer and a non-conductive film, featuring a first residue trace on the top surface and a second residue trace on one side, which are optimized to reduce the non-display area width through specific material compositions and manufacturing processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the width of the non-display area is reduced to increase immersion and enhance aesthetics, then the display area immersion and aesthetics are improved, but the manufacturing process complexity and difficulty increase
Solution Approach 1:
The patent applies preliminary action by forming a protective film on the mother substrate before the cutting process. This protective film is strategically positioned to prevent etchant from penetrating into areas where residue traces should not form, thereby enabling reduced non-display area width without compromising manufacturing reliability. The protective film is formed in advance to anticipate and prevent potential manufacturing issues during the cutting process.
Solution Approach 2:
The patent uses an intermediary approach by introducing a protective film as a mediator between the etchant and the mother substrate during the cutting process. This protective film acts as a temporary barrier that controls where the etchant can penetrate, allowing the formation of precise residue traces while protecting other areas. The protective film is removed after serving its mediating function, leaving the desired residue trace pattern.
2Area of stationary object
If the width of the non-display area is reduced to enhance aesthetics, then the aesthetics are improved, but the process yield may deteriorate due to manufacturing difficulties
Solution Approach 1:
The protective film is formed in advance on the mother substrate before cutting, creating a predetermined protection pattern that ensures reliable formation of residue traces. This preliminary action anticipates potential yield issues by pre-positioning the protective barrier, thereby maintaining high process yield even with reduced non-display area width.
Solution Approach 2:
The protective film serves as an intermediary that mediates between the etchant and the mother substrate, controlling the penetration process to ensure consistent and reliable residue trace formation. This intermediary protection mechanism reduces variability in the manufacturing process, thereby improving process yield while maintaining reduced non-display area dimensions.
3Area of stationary object
If the width of the non-display area is reduced to enhance immersion, then the display area immersion is improved, but manufacturing precision requirements increase
Solution Approach 1:
The protective film is formed in advance with a specific pattern that defines where residue traces should form. This preliminary patterning establishes precise boundaries before the cutting process begins, reducing the precision burden on the cutting process itself. The protective film acts as a pre-established guide that ensures consistent residue trace formation even with reduced non-display area width.
Solution Approach 2:
The protective film serves as an intermediary that mediates the interaction between the etchant and the mother substrate, controlling penetration to form precise residue traces. This intermediary layer provides a buffer that reduces the direct impact of cutting process variations, thereby maintaining manufacturing precision while enabling reduced non-display area dimensions.
Data Source
Figure 1
Figure 2
Figure 3
AI summary
A display device and method for manufacturing the display device are provided. The display device includes a display panel including at least one conductive layer (TFTL) and at least one non-conductive film (ENC) on the at least one conductive layer (TFTL); a first residue trace (RSD1) on a top surface of the at least one non-conductive film (ENC); and a second residue trace (RSD2) on one side of the first residue trace (RSD1).