Display Panel Shield Layer for Stable TFT Characteristics

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Solution Overview

Problem

Current display technologies face challenges in reducing power consumption while maintaining improved display quality, especially in diversified and thinner display apparatuses that require efficient voltage management and light shielding.

Innovation Solution

A display panel design incorporating a substrate with silicon-based and oxide-based thin-film transistors (TFTs), a shield layer with a metal material, and a voltage supply system that applies a consistent voltage to the shield layer, which includes patterns overlapping the TFTs to reduce external light interference and stabilize transistor characteristics.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a shield layer is added to block external light and stabilize transistor characteristics, then display quality and transistor stability are improved, but device complexity and manufacturing difficulty increase

Engineering Contradiction:
Improvetransistor characteristics stabilityVSAvoiddisplay panel structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The shield layer is integrated within the existing display panel structure, positioned between the substrate and the active transistor regions. This nested approach allows the shield layer to be incorporated without adding external components, thereby blocking external light and stabilizing transistor characteristics while minimizing increases in device complexity.

Inventive Principle:
Principle #7Nested doll (Nesting)

Solution Approach 2:

The shield layer acts as an intermediary element between the substrate and the transistor active regions. It mediates the interaction between external environmental factors (light) and the transistor characteristics, providing stabilization without requiring fundamental changes to the transistor design or operation.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If multiple TFT types (silicon-based and oxide-based) are used to optimize performance, then display quality is improved, but manufacturing complexity and process difficulty increase

Engineering Contradiction:
Improvetransistor performance optimizationVSAvoidTFT fabrication process
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

Different types of TFTs (silicon-based and oxide-based) are strategically positioned in different regions of the display panel based on their specific performance characteristics. Silicon-based TFTs may be used in regions requiring high switching speed, while oxide-based TFTs are used in regions requiring low leakage current. This local optimization allows each transistor type to be used where it provides the most benefit, improving overall display quality while managing manufacturing complexity through region-specific fabrication processes.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design achieves reduced power consumption and improved display quality by stabilizing transistor characteristics and minimizing light interference, enabling high-resolution displays with low power usage.

Implementation Method 1

a shield layer arranged between the substrate and the silicon-based TFTs... the pattern overlapping the silicon-based TFTs

Methodology Applied
Scientific EffectLight shielding: Absorption (EM radiation)

Data Source

PatentUS20240363647A1Display panel
Publication Date: 2024.10.31 SAMSUNG DISPLAY CO LTD
  • US20240363647A1 patent drawing
  • US20240363647A1 patent drawing
  • US20240363647A1 patent drawing

AI summary

A display panel includes a first thin-film transistor (“TFT”) arranged in a display area of a substrate and including a first semiconductor layer including a silicon semiconductor, a second TFT connected to the first TFT and including a second semiconductor layer including an oxide semiconductor, a voltage line connected to the first TFT, and a shield layer arranged between the substrate and the first semiconductor layer, and including a pattern and a connection line, the pattern overlapping the first semiconductor layer, the connection line extending from the pattern, and a voltage that is a same as a voltage applied to the voltage line being applied to the shield layer.