Display Pixel Structure with Integrated Light Sensing

The pixel is divided into multiple sub-pixels, each containing specific light-emitting devices and light-receiving devices. This segmentation allows for optimized arrangement of sensing and display functions within each sub-pixel, achieving high resolution while maintaining overall aperture ratio through selective placement of functional elements.

The patent utilizes vertical stacking of light-emitting devices and light-receiving devices in the third dimension. By arranging devices in multiple layers (first light-emitting device, second light-emitting device, first light-receiving device, second light-receiving device stacked vertically), the patent achieves high integration density without proportionally increasing the planar footprint, thus preserving aperture ratio while enabling high-resolution sensing.

The patent implements multi-functionality by integrating first light-emitting devices and second light-emitting devices with first light-receiving devices and second light-receiving devices in each pixel. This allows the display apparatus to simultaneously perform display, visible light sensing, and infrared light sensing functions using a unified pixel structure, reducing the need for separate sensor modules.

The patent merges display and sensing functions at the pixel level by combining light-emitting devices and light-receiving devices within the same pixel structure. This integration consolidates multiple functional elements into a single unified structure, managing complexity through functional convergence rather than separate components.

The patent removes the fine metal mask step from the manufacturing process entirely. By extracting this limiting step, the patent enables direct formation of island-shaped EL layers through alternative methods (such as photolithography with photoresist patterns), thereby eliminating the bottleneck that constrained both precision and productivity in conventional manufacturing.

The patent replaces the mechanical fine metal mask alignment system with a photolithography-based patterning system. This substitution eliminates the need for precise mechanical mask alignment and handling, enabling higher manufacturing precision through optical patterning while simultaneously improving productivity by removing the slow mask-based fabrication step.