Suction Unit for Display Polisher to Remove Liquid Residue
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Solution Overview
Problem
The manufacturing of display apparatuses faces challenges in preventing stains on substrates due to residual polishing materials, particularly liquids, which can lead to defects and incomplete removal during the polishing process.
Innovation Solution
A manufacturing apparatus and method that includes a polisher, conveyer, and suction unit to manage pressure differences, ensuring that at least 90% of the polishing material remains on the substrate, utilizing a suction pipe with an inclined inlet to maintain the liquid polishing material on the surface, thereby preventing its separation and facilitating complete removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a polishing material (liquid) is used to polish the base member, then the polishing effectiveness is improved, but the polishing material remains on the polished surface causing stains and defects
Solution Approach 1:
The suction unit extracts and removes the liquid polishing material from the polished surface of the base member. By creating a pressure difference that draws the liquid away from the surface, the system successfully separates the harmful residue from the polished component, eliminating stains and defects while maintaining polishing quality.
Solution Approach 2:
The suction unit acts as an intermediary mechanism between the polishing process and the final clean surface. It introduces a controlled pressure difference that mediates the removal of liquid polishing material, enabling effective extraction without compromising the integrity of the polished surface.
2Object-affected harmful factors
If the polishing material is completely removed from the surface, then contamination is reduced, but the polishing material may separate and create defects
Solution Approach 1:
The suction unit continuously monitors and adjusts the pressure difference to maintain optimal conditions for polishing material removal. This feedback mechanism ensures that the liquid polishing material is gradually extracted without causing sudden separation or surface defects, maintaining surface uniformity while reducing contamination.
Solution Approach 2:
The system prepares the polished surface for material removal by establishing a controlled pressure difference before complete extraction. This preliminary action prevents sudden separation of the polishing material and ensures a uniform removal process that maintains surface integrity.
3Productivity
If additional liquid polishing material is supplied during the process, then the polishing continues effectively, but the complexity of the manufacturing process increases
Solution Approach 1:
The suction unit enables the polishing system to self-regulate by automatically extracting excess liquid polishing material. This self-service mechanism eliminates the need for manual intervention or complex additional supply systems, maintaining polishing continuity while reducing overall process complexity.
Solution Approach 2:
The system utilizes pressure difference (pneumatic principle) to control the flow and removal of liquid polishing material. This hydraulic/pneumatic approach provides a simple yet effective mechanism for continuous polishing without requiring complex mechanical or manual supply systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively prevents the separation of polishing materials from the substrate, ensuring a uniformly planarized surface and reducing contamination, thus minimizing defects and the need for additional liquid supply, leading to improved manufacturing efficiency and reduced contamination risks.
Implementation Method 1
a suction unit corresponding to the conveyer and by which a pressure around the conveyer is provided to be lower than a pressure at remaining portions of the apparatus
Implementation Method 2
a suction unit corresponding to the conveyer and by which a pressure around the conveyer is provided to be lower than a pressure at remaining portions of the apparatus
Implementation Method 3
utilizing a suction pipe with an inclined inlet to maintain the liquid polishing material on the surface
Implementation Method 4
a polisher at which a polishing material is supplied to a base member of the display apparatus and the base member is polished with the polishing material
Data Source
AI summary
An apparatus for manufacturing a display apparatus includes: a polisher at which a polishing material is supplied to a base member of the display apparatus and the base member is polished with the polishing material to provide a polished base member having a polished surface; a conveyer to which the polished base member is provided from the polisher and from which the polished base member is transferred to outside the apparatus; and a suction unit corresponding to the conveyer and by which a pressure around the conveyer is provided to be lower than a pressure at remaining portions of the apparatus.