Display Contact Electrode Formation Using a Sacrificial Pattern

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Solution Overview

Problem

The existing display manufacturing processes are inefficient due to the reliance on complex mask processes, which hinder the reduction of the mask process steps and thereby impede process efficiency.

Innovation Solution

A manufacturing method for display apparatuses that involves forming a sacrificial pattern with a tapered shape, using an etchant with high selectivity to expose and etch the pattern, and forming contact electrodes by removing portions of the contact electrode layer, thereby reducing the number of masks required and improving process efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If complex mask processes are used to form contact electrodes, then manufacturing precision is improved, but device complexity and loss of time increase

Engineering Contradiction:
Improvecontact electrode formation precisionVSAvoidmask process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

A sacrificial pattern is formed in advance on the light emitting element before forming the contact electrode layer. This preliminary sacrificial structure guides the subsequent etching process to automatically create precise contact electrodes without requiring complex masks during the electrode formation stage itself.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The sacrificial pattern serves as an intermediary element that temporarily exists to enable precise contact electrode formation. The etchant uses this sacrificial pattern as a mediator to define the contact electrode geometry, after which the sacrificial pattern is removed, leaving the precisely formed contact electrodes.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If multiple mask processes are used to form contact electrodes, then manufacturing precision is improved, but productivity decreases

Engineering Contradiction:
Improvecontact electrode formation precisionVSAvoidmanufacturing efficiency
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The sacrificial pattern is prepared beforehand to define the contact electrode geometry. This allows the contact electrode layer to be formed in a single etching step without requiring multiple sequential mask processes, thereby maintaining precision while significantly improving manufacturing efficiency.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The complex mask processes are extracted and replaced by the simpler sacrificial pattern approach. The essential function of defining contact electrode geometry is achieved through the sacrificial pattern and selective etching, eliminating the need for multiple mask application and removal cycles.

Inventive Principle:
Principle #2Taking out (Extraction)

3Manufacturing precision

If additional mask processes are used to form contact electrodes, then manufacturing precision is improved, but loss of time increases

Engineering Contradiction:
Improvecontact electrode formation precisionVSAvoidprocess time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The sacrificial pattern is formed in advance to pre-defide the contact electrode geometry. This eliminates the need for time-consuming mask processes during contact electrode formation, reducing overall process time while maintaining precision through the pre-established sacrificial structure.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The sacrificial pattern acts as a time-saving intermediary that enables single-step contact electrode formation. By using this mediator, the complex multi-step mask process is replaced with a simpler, faster process that achieves the same precision outcome.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method allows for the simultaneous formation of contact electrodes using the sacrificial pattern without additional mask processes, enhancing manufacturing efficiency by reducing the number of masks needed and improving the etching selectivity, thus streamlining the display manufacturing process.

Implementation Method 1

An etching selectivity of the etchant with the sacrificial pattern may be greater than an etching selectivity of the etchant with the contact electrode layer.

Methodology Applied
Scientific EffectEtching selectivity:

Data Source

PatentUS20230282775A1Display apparatus and manufacturing method therefor
Publication Date: 2023.09.07 SAMSUNG DISPLAY CO LTD
  • US20230282775A1 patent drawing
  • US20230282775A1 patent drawing
  • US20230282775A1 patent drawing

AI summary

Provided are a display apparatus and a manufacturing method therefor. The manufacturing method for the display apparatus includes preparing a substrate on which a first electrode and a second electrode are formed, disposing a light emitting element between the first electrode and the second electrode, forming a sacrificial pattern on the light emitting element, the sacrificial pattern exposing an end portion and another end portion of the light emitting element, forming a contact electrode layer on the sacrificial pattern, and the end portion and the another end portion of the light emitting element, and forming a first contact electrode and a second contact electrode by removing a portion of the contact electrode layer formed on the sacrificial pattern.