Display Device Self-Aligned Patterning Without Fine Metal Masks

The patent removes the fine metal mask from the manufacturing process entirely, extracting the problematic element that caused deviations in shape and position. Instead of using photolithography with metal masks, the invention employs a self-aligned patterning method where the light-emitting layer is directly patterned based on the pixel electrode pattern, eliminating mask-related errors and simplifying the manufacturing process.

The patent performs preliminary patterning of the pixel electrode before forming the light-emitting layer. The pixel electrode pattern is created first with appropriate thickness and structure, then the light-emitting layer is deposited and patterned to align with this pre-formed electrode pattern. This preliminary action eliminates the need for subsequent mask-based patterning, preventing thickness reduction and damage that would occur with fine metal masks.

The patent introduces an insulating layer as an intermediary between adjacent light-emitting devices. This insulating layer is positioned to cover the side surfaces and top surfaces of the pixel electrodes, effectively blocking leakage currents that would otherwise flow between closely spaced devices. The intermediary insulating layer enables closer spacing for higher aperture ratio while maintaining reliability by preventing electrical interference.

The patent merges the patterning steps for the pixel electrode and light-emitting layer into a single self-aligned process. The light-emitting layer is deposited over the entire substrate and then patterned using the pixel electrode pattern as a reference, combining what would otherwise be separate high-precision alignment steps into one unified process. This merging approach enables closer spacing for higher aperture ratio without proportionally increasing manufacturing precision requirements.