Display Device Single Etching Contact Electrode Formation
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Solution Overview
Problem
Current display device manufacturing methods are complex and require multiple masks, making the process inefficient and costly due to the need for precise alignment and etching of electrodes and insulation patterns.
Innovation Solution
A simplified manufacturing method for a display device that reduces the number of masks by forming the first and second contact electrodes simultaneously through a single etching process, using a photoresist and electrode layer, and forming an insulation pattern that exposes ends of the light emitting element, allowing for concurrent formation of electrodes without separate masks or exposure processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple masks are used for precise alignment and etching of electrodes and insulation patterns, then manufacturing precision is improved, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent combines the formation of the insulation pattern and the contact electrodes into a single etching process. The etching pattern is designed to simultaneously create the insulation structure and define the electrode positions, eliminating the need for separate masking and etching steps for each component. This merging of operations reduces process complexity while maintaining the required precision through careful pattern design.
Solution Approach 2:
The single etching pattern serves multiple functions: it creates the insulation pattern, defines the contact electrode geometry, and establishes the relative positioning between insulation and electrodes. This multi-functional approach replaces what would traditionally require multiple specialized masks and etching steps, reducing both process complexity and the number of alignment operations required.
2Manufacturing precision
If multiple masks and separate etching processes are used for forming electrodes and insulation patterns, then manufacturing precision is improved, but productivity decreases
Solution Approach 1:
The patent merges multiple sequential operations (masking for insulation, etching insulation, masking for electrodes, etching electrodes) into a single etching operation. By designing the etching pattern to simultaneously define both the insulation pattern and contact electrode positions, the process reduces the number of cycle steps, thereby improving manufacturing throughput and productivity while maintaining etching precision through optimized pattern geometry.
3Manufacturing precision
If multiple separate processes are used for forming contact electrodes, then manufacturing precision is improved, but loss of time increases
Solution Approach 1:
The patent combines the formation of multiple contact electrodes into a single etching step. The etching pattern is designed to simultaneously create all necessary contact electrode openings and insulation structures in one operation, eliminating the time required for multiple sequential masking and etching processes. This single-step approach maintains positioning precision through the geometric design of the etching pattern while dramatically reducing the manufacturing cycle time.
Data Source
Figure 1A~1B
Figure 2A~2B
Figure 3A~3B
AI summary
A display device includes a substrate (SUB), a first bank pattern (PW1) and a second bank pattern (PW2) on the substrate (SUB) and spaced apart from each other, a first electrode (ELT1) on the first bank pattern (PW1), and a second electrode (ELT2) on the second bank pattern (PW2), a light emitting element (LD) between the first bank pattern (PW1) and the second bank pattern (PW2), an insulation pattern (INS2) on the light emitting element (LD), and exposing a first end (EP1) and a second end (EP2) of the light emitting element (LD) respectively adjacent to the first bank pattern (PW1) and the second bank pattern (PW2), a third electrode (CNE1) contacting the first electrode (ELT1) and the first end (EP1) of the light emitting element (LD), and a fourth electrode (CNE2) contacting the second electrode (ELT2) and the second end (EP2) of the light emitting element (LD, wherein a thickness of the insulation pattern is within a range of about 50% to about 150% of a thickness of the first bank pattern.