Multi-Layer Insulating Structure for Display Device Thickness and Quality
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Solution Overview
Problem
Existing display devices face challenges in minimizing thickness while maintaining improved display quality, particularly in achieving uniform insulating layer thickness and preventing image quality defects like color deviation and crosstalk.
Innovation Solution
The display device incorporates a structure with a substrate, active layer, conductive layers, and insulating layers, including a first and second sub-insulating layer with different materials and etching rates, to form a capacitor with increased capacity in a limited space, optimizing the layout to minimize thickness and prevent short circuits.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a single insulating layer is used, then the manufacturing process is simple, but the thickness uniformity is poor leading to display quality defects
Solution Approach 1:
The insulating layer is divided into multiple sub-layers (first sub-insulating layer and second sub-insulating layer) with different materials and etching rates. This segmentation allows each sub-layer to be optimized independently for thickness uniformity and etching characteristics, resolving the contradiction between manufacturing simplicity and thickness precision.
Solution Approach 2:
Different insulating materials are used for the first and second sub-insulating layers, creating a composite structure. This composite approach enables tailored etching rates and thickness control for each layer, improving overall thickness uniformity while maintaining manufacturing feasibility through selective etching processes.
2Reliability
If the capacitor size is increased to improve display quality, then the display performance is enhanced, but the device thickness increases
Solution Approach 1:
The capacitor structure utilizes vertical stacking with multiple conductive layers and insulating layers arranged in different dimensions. This three-dimensional configuration increases capacitor capacity without proportionally increasing the horizontal footprint, thereby improving display quality while controlling device thickness.
Solution Approach 2:
Multiple conductive layers and insulating layers are nested within each other to form a compact capacitor structure. The first and second conductive layers are embedded within the multi-layer insulating structure, maximizing space utilization and increasing capacitor capacity without significantly increasing overall device thickness.
3Quantity of substance
If different insulating materials with different etching rates are used, then the capacitor capacity is increased, but the manufacturing complexity increases
Solution Approach 1:
Different insulating materials are applied locally to specific regions (first sub-insulating layer and second sub-insulating layer) based on their functional requirements. This localized material selection optimizes etching rates and capacitor capacity in different areas without requiring complete structural redesign, balancing manufacturing complexity with performance enhancement.
Data Source
AI summary
A display device including: a substrate; an active layer, and including channel and conductive regions; a first conductive layer including a driving gate electrode and a scan line in a first direction; a second conductive layer including a storage line; a third conductive layer including a first connecting member above the storage line; an insulating layer between the storage line and the first connecting member; and a data line and a driving voltage line crossing the scan line in a second direction, wherein the first connecting member electrically connects the driving gate electrode and a conductive region, the driving voltage line overlaps the first connecting member, the insulating layer includes first and second sub-insulating layers, and an edge of the second sub-insulating layer substantially overlaps an edge of the first connecting member in a thickness direction of the display device.