Display Substrate Layout for Higher Aperture Ratio Pixels
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Solution Overview
Problem
As display products achieve higher resolution, the pixel size decreases, leading to a smaller aperture ratio, which affects the light utilization and increases power consumption. Existing technologies face challenges in optimizing pixel design and increasing the aperture ratio due to limitations in gate line width, data line width, and black matrix line width.
Innovation Solution
A display substrate design with a half-via half-connection manner and protective electrode blocks at the thin film transistor's second electrode, combined with optimized wiring and reduced black matrix line width, enhances the aperture ratio while maintaining production efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the pixel size is reduced to achieve higher resolution, then the resolution is improved, but the aperture ratio becomes smaller
Solution Approach 1:
The patent applies dimensionality change by implementing a top-gate transistor structure where the gate electrode is positioned above the active layer rather than beside it. This vertical arrangement allows the gate line to extend in the row direction while the data line extends in the column direction, enabling more efficient space utilization within the pixel. The via holes connecting different layers add a third dimension (vertical connectivity) to the wiring scheme, effectively increasing the aperture ratio by reducing the area occupied by conductive structures in the planar view.
Solution Approach 2:
The patent segments the wiring structure into multiple functional layers: the first conductive layer contains data lines and electrode lines, the second conductive layer contains gate lines and common electrodes, and via holes provide vertical connections between layers. This segmentation allows different wiring functions to be distributed across layers, reducing planar overlap and minimizing the area occupied by conductive structures, thereby increasing the aperture ratio while maintaining high resolution.
2Area of stationary object
If the gate line width and data line width are reduced to increase aperture ratio, then the aperture ratio is improved, but the manufacturing precision requirements increase
Solution Approach 1:
The patent utilizes vertical layering to separate wiring functions, with gate lines in the second conductive layer and data lines in the first conductive layer. This three-dimensional arrangement allows for adequate line widths in each layer without excessive planar overlap, reducing the need for extremely narrow lines and thereby lowering manufacturing precision requirements while still achieving high aperture ratios.
Solution Approach 2:
The patent employs a top-gate transistor structure where the gate electrode is formed above the active layer before final pixel electrode deposition. This preliminary positioning of the gate structure allows for optimized spacing and reduced overlap with data lines and pixel electrodes, enabling larger effective aperture areas without requiring ultra-precise control of line widths during subsequent manufacturing steps.
3Area of stationary object
If the black matrix line width is reduced to increase aperture ratio, then the aperture ratio is improved, but the light shielding effectiveness may be compromised
Solution Approach 1:
The patent implements light shielding functionality in the vertical dimension by positioning the common electrode and black matrix structures in the second conductive layer above the pixel electrodes. This vertical arrangement allows the black matrix to effectively shield light from below while occupying minimal planar area, as the shielding function is achieved through vertical positioning rather than wide horizontal extensions, thereby increasing aperture ratio while maintaining light shielding effectiveness.
Solution Approach 2:
The patent introduces the common electrode as an intermediary structure that serves dual functions: it provides electrical connection for the liquid crystal modulation and simultaneously acts as part of the light shielding system when combined with the black matrix. This intermediary structure enables effective light blocking with reduced line widths by distributing the shielding function across multiple components in the vertical stack.
Data Source
AI summary
A display substrate is provided, including: a base substrate and a first conductive layer, a first insulating layer, a second conductive layer, a second insulating layer and a third conductive layer sequentially arranged away from the base substrate. The first conductive layer includes: data lines and electrode lines, and first and a second electrodes of a thin film transistor. The second conductive layer includes a common electrode and protective electrode blocks, the common electrode includes openings, and an orthographic projection of at least one protective electrode blocks on the base substrate falls within an orthographic projection of at least one openings of the common electrode on the base substrate. The third conductive layer includes pixel electrodes, and the pixel electrode is connected to a protective electrode block and the second electrode of the thin film transistor through a first via hole.


