Display Substrate Etch Mask Segmentation for Over-Etching Control
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Solution Overview
Problem
The challenge is to prevent over-etching of conductive films during the formation of source and drain electrodes and to improve the etch profile of contact holes in display substrates, particularly in the context of low driving voltage and low power consumption requirements for modern electronic display devices.
Innovation Solution
A display substrate manufacturing method involving the use of a first etch mask with varying thickness regions to pattern data wiring and oxide semiconductor layers, followed by a second etch mask to form source and drain electrodes, with a buffer layer pattern to protect the conductive films from etching gases, ensuring precise control over etching processes and maintaining the integrity of the conductive materials.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single etch mask is used to pattern source/drain electrodes and contact holes, then the manufacturing process is simpler, but over-etching of conductive films occurs and etch profile is poor
Solution Approach 1:
The etch mask is divided into two separate masks: a first etch mask for patterning the data wiring conductive film and oxide semiconductor layer, and a second etch mask for patterning source/drain electrodes and contact holes. This segmentation allows each mask to be optimized for its specific function, preventing over-etching while achieving good etch profile
Solution Approach 2:
The first etch mask is formed and used to pattern the data wiring conductive film and oxide semiconductor layer before the second etch mask is applied. This preliminary action prepares the structure for subsequent etching steps, ensuring that conductive films are protected from over-etching during contact hole formation
2Productivity
If etching is performed to form contact holes, then contact holes are created, but conductive films are over-etched
Solution Approach 1:
The data wiring conductive film is patterned into a data wiring conductive film pattern using the first etch mask before contact holes are formed. This preliminary patterning creates a protective structure that prevents etching gases from reaching and damaging the conductive film during contact hole etching
Solution Approach 2:
The data wiring conductive film pattern acts as an intermediary protective layer between the etching gases and the underlying conductive films. This intermediate structure allows contact holes to be formed while protecting the conductive films from over-etching
Data Source
AI summary
Provided are a display substrate, a display device, and a method of manufacturing the display substrate. The display substrate includes: a substrate in which a pixel region is defined; a gate electrode and a gate pad are formed on the substrate; a gate insulating layer formed on the gate electrode and the gate pad; a buffer layer pattern overlaps the gate electrode and is formed on the gate insulating layer; an insulating film pattern formed on the buffer layer pattern; an oxide semiconductor pattern formed on the insulating film pattern; a source electrode formed on the oxide semiconductor pattern; and a drain electrode formed on the oxide semiconductor pattern and is separated from the source electrode.