Display Substrate Flatness via Segmented Photo Spacer
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Solution Overview
Problem
The existing display technology, specifically the Half-Tone Mask, suffers from low flatness of the upper surface of the photo spacer, which reduces the supporting effect and increases the risk of damage to the display product under external forces.
Innovation Solution
A display substrate with an underlayer and an organic structure, where the organic structure includes a first surface away from the underlayer with a controlled distance variation, ensuring a difference of less than or equal to 0.06 μm between the maximum and minimum distances. This structure can include photo spacers or color filter patterns with protrusions and dents, and is prepared using a mask with specific light blocking bars and slits to achieve improved flatness and supporting effectiveness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a Half-Tone Mask is used to simultaneously produce the main photo spacer and the sub PS, then the manufacturing process is reduced, but the flatness of the upper surface of the photo spacer becomes low
Solution Approach 1:
The patent segments the photo spacer structure into multiple regions with different heights (first photo spacer region, second photo spacer region, third photo spacer region) to achieve both process efficiency and surface flatness. By dividing the spacer into discrete height levels rather than using a continuous gradient, the manufacturing process remains simplified while the top surface achieves the required flatness tolerance of ≤0.06μm.
2Ease of manufacture
If the flatness of the upper surface of the photo spacer is low, then the manufacturing process is simpler, but the supporting effect of the photo spacer is reduced
Solution Approach 1:
The patent applies local quality by ensuring that the top surface of the photo spacer (the surface that requires supporting function) has high flatness and uniform thickness, while the internal structure can have varying heights. The first, second, and third photo spacer regions are configured such that their top surfaces form a substantially flat plane, providing uniform supporting effect across the entire photo spacer area.
3Device complexity
If the flatness of the photo spacer surface is insufficient, then the manufacturing complexity is lower, but the risk of damage under external forces increases
Solution Approach 1:
The patent introduces curved surfaces (arc surfaces) on the side walls of the photo spacer regions, transitioning from the underlayer to the top surface. This curvature design distributes mechanical stress more evenly across the photo spacer structure, enhancing its resistance to external forces and improving reliability while maintaining a relatively simple overall structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution enhances the flatness of the display substrate's surface, improving the supporting effect and reducing the risk of damage when subjected to external forces, thereby increasing the quality and reliability of the display panel.
Implementation Method 1
Mask is a patterning master used in the photolithography field. During the exposure process, the pattern of the photomask is transferred to a corresponding product carrier.
Implementation Method 2
the mask includes a plurality of first slits, each of the first slits is provided with a plurality of first light blocking bars arranged in the same direction and a plurality of second light blocking bars arranged in the same direction
Data Source
AI summary
Provided are a display substrate and a preparation method thereof, a display panel and a mask. The display substrate includes an underlayer and an organic structure disposed on the underlayer. The organic structure includes a first surface arranged away from the underlayer; in a direction perpendicular to a plane where the underlayer is located, a difference between a maximum distance between the first surface and the underlayer and a minimum distance between the first surface and the underlayer is less than or equal to 0.06 μm.