Display Substrate Negative Photoresist Support Structure Water Vapor Isolation
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Solution Overview
Problem
The use of negative photoresist in OLED manufacturing leads to poor water vapor isolation due to its high hydroscopicity and air permeability, causing corrosion of the light-emitting layer and reducing the service life of light-emitting devices.
Innovation Solution
A method for manufacturing a display substrate involving the formation of a support structure using a negative photosensitive polymer, which includes forming a control structure layer, a first planarization layer, a support structure, a protection layer enveloping the support structure, a second planarization layer, and a first electrode, where the protection layer is made of silicon nitride or silicon oxide to prevent water vapor intrusion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If negative photoresist is used to form the support structure, then the mask support effect is improved, but water vapor isolation capability deteriorates
Solution Approach 1:
The patent uses a composite structure consisting of negative photoresist material combined with a protection layer (silicon nitride or silicon oxide). The negative photoresist provides the necessary mechanical support for the mask, while the protection layer provides the water vapor isolation capability. This composite approach allows both the mask support effect and water vapor isolation to be achieved simultaneously without compromising either function.
2Strength
If negative photoresist is used to form the support structure, then the support effect is improved, but service life of light-emitting device deteriorates
Solution Approach 1:
The patent employs a composite structure where negative photoresist provides mechanical support and a protection layer (silicon nitride or silicon oxide) provides environmental barrier. This combination maintains the excellent support effect while preventing water vapor from reaching and corroding the light-emitting layer, thereby extending the service life of the light-emitting device.
Solution Approach 2:
The protection layer acts as an intermediary barrier between the negative photoresist support structure and the light-emitting layer. It prevents direct contact between water vapor and the light-emitting layer, eliminating the corrosion mechanism while preserving the support function of the negative photoresist structure.
3Strength
If negative photoresist is used to form the support structure, then the mask support effect is improved, but corrosion resistance of light-emitting layer deteriorates
Solution Approach 1:
The patent creates a composite structure where the protection layer (silicon nitride or silicon oxide) serves as a corrosion-resistant barrier. This layer prevents water vapor from reaching the light-emitting layer, thereby eliminating corrosion while maintaining the mask support effect provided by the negative photoresist support structure.
Solution Approach 2:
The protection layer functions as an intermediary protective barrier that blocks harmful water vapor from reaching the light-emitting layer. This intermediary layer preserves the beneficial mask support effect while eliminating the harmful corrosion effect.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The protection layer effectively isolates water vapor, preventing corrosion of the light-emitting layer and ensuring the display performance, while maintaining the improved support effect of the negative photoresist, thus enhancing the service life of the light-emitting device.
Implementation Method 1
forming a support structure on the first planarization layer, where a material of the support structure includes a negative photosensitive polymer
Implementation Method 2
forming a protection layer enveloping the support structure on the first planarization layer formed with the support structure; the protection layer is made of silicon nitride or silicon oxide to prevent water vapor intrusion
Data Source
AI summary
A display substrate, a method for manufacturing the same and a display device are provided. The method for manufacturing the display substrate includes: forming a control structure layer on a base substrate; forming a first planarization layer on the control structure layer; forming a support structure on the first planarization layer, a material of the support structure includes a negative photosensitive polymer; forming a protection layer enveloping the support structure on the first planarization layer formed with the support structure; forming a second planarization layer on the protection layer; and forming a first electrode on the second planarization layer, the first electrode is electrically connected to the control structure layer.