Dual-Active-Area Display Transistor for Threshold Voltage Stability

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Solution Overview

Problem

During the aging process in display device manufacturing, a shift in threshold voltage of transistors can degrade their performance, leading to deteriorated display device performance and increased defects and yield reduction.

Innovation Solution

A display device design featuring a transistor with a dual active area structure, including a first and second active area, a gate insulating layer, and charge layers positioned at specific interfaces to shift the threshold voltage in opposite directions, effectively compensating for voltage shifts and minimizing defects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a conventional single active area transistor structure is used, then the manufacturing process is simple, but the threshold voltage shifts during aging process degrading transistor performance

Engineering Contradiction:
Improvetransistor performance stabilityVSAvoidtransistor structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The transistor is divided into a dual active area structure with first and second active areas, each having separate channel areas adjacent to source and drain regions. This segmentation allows independent charge layer formation in each active area, enabling threshold voltage compensation through opposite charges while maintaining manufacturing feasibility through systematic process steps.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different charge layers are formed in different active areas with opposite charges (positive in first active area, negative in second active area, or vice versa). This local differentiation allows threshold voltage shifts to be compensated in opposite directions, stabilizing overall transistor performance during aging while maintaining a structured approach to manufacturing complexity.

Inventive Principle:
Principle #3Local quality

2Reliability

If aging process is applied to prevent transistor characteristic changes, then transistor reliability is improved, but manufacturing process time and complexity increase

Engineering Contradiction:
Improvetransistor characteristic stabilityVSAvoidmanufacturing process time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The dual active area structure with opposite charge layers is designed to inherently compensate for threshold voltage shifts during aging. By pre-configuring the transistor with this symmetric dual structure, the patent eliminates the need for additional aging process steps, thereby maintaining reliability improvement while reducing manufacturing time and process complexity.

Inventive Principle:
Principle #10Preliminary action

3Reliability

If dual active area structure with charge layers is implemented, then threshold voltage stability is improved, but manufacturing precision requirements increase

Engineering Contradiction:
Improvethreshold voltage stabilityVSAvoidcharge layer positioning precision
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The transistor is divided into a dual active area structure with first and second active areas, each having separate channel areas adjacent to source and drain regions. This segmentation allows independent charge layer formation in each active area, enabling threshold voltage compensation through opposite charges while maintaining manufacturing feasibility through systematic process steps.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent employs opposite charge layers with controlled charge densities and distributions in different active areas. By adjusting the charge parameters (positive in first active area, negative in second active area), the threshold voltage shifts are compensated in opposite directions, achieving stability without requiring extreme manufacturing precision.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20240079420A1Display device and method of manufacturing the same
Publication Date: 2024.03.07 SAMSUNG DISPLAY CO LTD
  • US20240079420A1 patent drawing
  • US20240079420A1 patent drawing
  • US20240079420A1 patent drawing

AI summary

A display device includes a transistor including an active layer including first and second active areas, where the first active area includes a first drain area, a source area, and a first channel area between the source area and the first drain area, and the second active area includes the source area, a second drain area, and a second channel area between the source area and the second drain area, a gate insulating layer on the active layer, first and second charge layers at an interface between the first channel area and the gate insulating layer and at an interface between the second channel area and the gate insulating layer, where the first charge layer is adjacent to the source area, and the second charge layer is adjacent to the first and second drain areas and has a charge opposite to a charge of a first charge layer.