Display Electrode Wiring Layout for Suppressing Voltage Drop

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Solution Overview

Problem

Existing active matrix display apparatuses suffer from voltage drops due to thin electrodes and large areas, which hinder high-resolution displays, and manufacturing methods like standard UV photolithography face difficulties in achieving high resolution.

Innovation Solution

The display apparatus incorporates an auxiliary wiring system with multiple wiring layers, including a first and second wiring layer connected through a contact hole in an insulating layer, and a lattice-shaped second wiring layer to suppress voltage drops, featuring tapered end portions and specific angle ranges for organic compound layers.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If a single-layer auxiliary wiring is used, then the structure is simple, but the voltage drop cannot be sufficiently suppressed

Engineering Contradiction:
Improvevoltage dropVSAvoidwiring structure
Core Design Contradiction:
Loss of energyVSDevice complexity

Solution Approach 1:

The patent transitions from a single-layer auxiliary wiring to a multi-layer auxiliary wiring structure. The first auxiliary wiring is formed in one layer, and the second auxiliary wiring is formed in another layer above it, with electrical connection through contact holes. This dimensional change allows the wiring to suppress voltage drop more effectively by providing multiple parallel conduction paths while managing complexity through vertical stacking.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The auxiliary wiring is segmented into multiple independent layers (first auxiliary wiring and second auxiliary wiring) that are electrically connected. Each layer can be independently designed and optimized, allowing the system to achieve better voltage drop suppression through distributed conduction paths while maintaining manufacturing feasibility.

Inventive Principle:
Principle #1Segmentation

2Manufacturing precision

If standard UV photolithography is used, then the manufacturing process is simple, but high resolution cannot be achieved

Engineering Contradiction:
Improvedisplay resolutionVSAvoidmanufacturing process
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent changes the key parameter of the lithography process from UV light to X-ray light. X-ray lithography enables much finer feature sizes and higher resolution compared to standard UV photolithography. Although the manufacturing process becomes more complex, the parameter change in radiation type allows achieving the required high resolution for advanced display applications.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20250344589A1Display apparatus
Publication Date: 2025.11.06 SEMICON ENERGY LAB CO LTD
  • US20250344589A1 patent drawing
  • US20250344589A1 patent drawing
  • US20250344589A1 patent drawing

AI summary

A display apparatus in which a voltage drop is sufficiently suppressed is provided. The display apparatus includes a first light-emitting device including a first lower electrode and a first organic compound layer positioned over the first lower electrode; a second light-emitting device including a second lower electrode and a second organic compound layer positioned over the second lower electrode; a common electrode included in the first light-emitting device and the second light-emitting device; and an auxiliary wiring electrically connected to the common electrode. The auxiliary wiring includes a first wiring layer and a second wiring layer; the second wiring layer is electrically connected to the first wiring layer through a contact hole in an insulating layer; and the second wiring layer has a lattice shape in a top view.