Distortion-Based Mask Generation for 3D Object Editing
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Solution Overview
Problem
Digital image editing systems face challenges in accurately applying edits to three-dimensional objects due to distortion in the mapping between two-dimensional and three-dimensional representations, leading to undesired distortions such as 'warping' or 'stretching', especially in regions with high oversampling or undersampling distortion.
Innovation Solution
A distortion-based mask generation system that determines distortion metrics at various locations in a two-dimensional representation of a three-dimensional object, using a GPU to prevent modification of pixel values where distortion exceeds a threshold, thereby preventing paint application in high-distortion areas and allowing partial or full modification in low-distortion areas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If digital image editing is applied to three-dimensional objects using two-dimensional representations, then editing operations can be performed on 3D objects, but distortion occurs in the mapping between 2D and 3D spaces causing warping or stretching of edited regions
Solution Approach 1:
The patent segments the 3D object surface into multiple regions based on distortion metrics, creating a mask that identifies high-distortion and low-distortion areas. This segmentation allows selective application of editing operations only in regions where geometric accuracy can be maintained, resolving the contradiction between enabling 3D editing and preserving geometric precision.
Solution Approach 2:
The patent applies local quality by computing distortion metrics at each location of the 2D representation and generating a spatial mask that varies distortion characteristics across different regions. This allows the editing system to adaptively apply edits only in regions with acceptable distortion levels, maintaining local geometric accuracy while still enabling overall 3D editing capability.
2Manufacturing precision
If distortion metrics are computed at every location to generate accurate masks, then editing precision is improved, but computational complexity and processing time increase
Solution Approach 1:
The patent performs preliminary computation of distortion metrics and generates the editing mask before the actual editing operation is applied. By pre-computing the distortion characteristics and identifying suitable regions in advance, the system avoids complex real-time calculations during the editing process itself, thus maintaining high edit accuracy while managing computational complexity.
Solution Approach 2:
The patent substitutes complex mechanical or manual distortion analysis with automated computational methods using graphics processing units (GPUs). This replacement of traditional analysis methods with parallel computing architectures enables efficient calculation of distortion metrics across the entire 2D representation, achieving high precision editing guidance without excessive computational burden.
3Manufacturing precision
If masks are generated to prevent painting in high-distortion areas, then distortion-free editing is achieved, but the editable area of the object is reduced
Solution Approach 1:
The patent employs parameter changes by adjusting the distortion threshold that determines which regions are included in the editable mask. By allowing users to modify this threshold parameter, the system can dynamically balance between maintaining high distortion-free quality and maximizing the editable surface area, enabling flexible trade-offs based on specific editing needs.
Data Source
AI summary
A method, system, and computer-readable storage medium are disclosed for distortion-based mask generation. A respective distortion metric may be determined at each location of a plurality of locations in a two-dimensional representation of a three-dimensional object. The two-dimensional representation may be based on a view of the three-dimensional object. Each respective distortion metric may indicate a degree of distortion in a mapping between the respective location in the two-dimensional representation and a corresponding location in a surface texture of the three-dimensional object. The visual representation of the respective distortion metric at one or more of the plurality of locations may be displayed.