Distributed Inlet Transfer Chamber Gas Purge for Particulate Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional electronic device manufacturing systems are ineffective in controlling particulates within the transfer chamber, which can impact substrate quality during processing.
Innovation Solution
A transfer chamber gas purge apparatus with distributed inlets in the chamber lid and outlets in the chamber floor, including diffusing elements, provides improved gas flow patterns to minimize particulates, with primary and secondary inlets being independently controllable to ensure laminar gas flow above substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If conventional gas inlet and outlet configuration is used in the transfer chamber, then the system structure is simple, but the particulate control effectiveness is insufficient
Solution Approach 1:
The gas inlet is divided into multiple distributed inlet ports across the chamber lid rather than a single inlet. This segmentation allows gas to be introduced at multiple locations simultaneously, creating more effective gas flow patterns that reduce particulates throughout the transfer chamber volume.
Solution Approach 2:
The gas inlet configuration transitions from a conventional single-point inlet to a distributed array of inlet ports across the chamber lid surface. This dimensional change from point-source to surface-distributed injection creates superior gas flow distribution and particulate control effectiveness.
2Object-affected harmful factors
If gas flow rate is increased to improve particulate removal, then particulate control improves, but gas consumption and energy loss increase
Solution Approach 1:
Different regions of the chamber lid are equipped with inlet ports that can be independently controlled. This allows gas flow to be optimized locally in different areas of the transfer chamber, applying gas only where needed rather than uniformly throughout, thereby reducing overall gas consumption while maintaining effective particulate control.
Solution Approach 2:
The system enables independent control of gas flow parameters (flow rate, timing) for primary and secondary inlet groups. This parameter optimization allows the system to achieve effective particulate removal with minimized gas consumption by adjusting flow rates to the minimum necessary levels.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The improved gas flow apparatus effectively reduces particulates in the transfer chamber, enhancing the quality of processed substrates by maintaining a clean environment during substrate transfer and processing.
Implementation Method 1
primary and secondary inlets being independently controllable to ensure laminar gas flow above substrates
Implementation Method 2
including diffusing elements, provides improved gas flow patterns to minimize particulates
Data Source
AI summary
Transfer chamber gas purge apparatus are disclosed. The transfer chamber gas purge apparatus has a transfer chamber adapted to contain at least a portion of a transfer robot, the transfer chamber including side walls, a chamber lid, and a chamber floor, wherein the chamber lid has a plurality of distributed chamber inlets. The plurality of distributed chamber inlets may include diffusing elements. Laminar purge gas flow may be provided above the substrate. Systems and methods including a plurality of distributed chamber inlets are disclosed, as are numerous other aspects.