Divertless Precursor Gas Dosing With Pressure-Charged LCV
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Solution Overview
Problem
Current atomic-layer deposition (ALD) processes face issues with precursor gas waste and variability due to the use of divert systems, which divert gases to a foreline, leading to inefficiencies and inconsistent deposition results.
Innovation Solution
A divertless gas-dosing system that uses a line charge-volume (LCV) to store precursor gas at a predefined pressure, eliminating the need for diverting and wasting gas, and employs a flow controller to maintain a set point flow independently of inlet valves, reducing variability and waste.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a divert system is used to manage precursor gas flow in ALD processes, then gas flow control is simplified, but precursor gas waste increases and deposition consistency deteriorates
Solution Approach 1:
The patent removes the divert system entirely from the gas delivery pathway. By extracting the problematic divert component, the system eliminates the source of gas waste while maintaining simplified operation through alternative valve control mechanisms that directly deliver gas to the chamber without diversion.
Solution Approach 2:
The system pre-charges a line charge volume (LCV) with the precise amount of precursor gas needed for each deposition cycle before the actual deposition begins. This preliminary charging ensures that the exact required dose is prepared in advance, eliminating waste from diverting excess gas while maintaining operational simplicity.
2Ease of operation
If a divert system is used to manage precursor gas flow, then gas delivery is simplified, but deposition precision and consistency worsen
Solution Approach 1:
The patent incorporates pressure sensors that monitor the LCV charging process and provide feedback to the control system. This feedback mechanism ensures precise control of the precursor gas dose by measuring actual pressure levels and adjusting delivery accordingly, thereby maintaining deposition consistency without requiring a divert system.
Solution Approach 2:
The system replaces the mechanical divert valve mechanism with an electronic control system that uses pressure sensors and controlled valve timing to regulate gas delivery. This substitution maintains ease of operation through automated control while achieving superior deposition precision through accurate pressure-based dosing.
3Ease of operation
If divert systems are used in ALD processes, then gas flow management is easier, but process efficiency decreases due to gas waste
Solution Approach 1:
The system uses the precursor gas itself to charge the LCV to a predetermined pressure, making the dosing process self-regulating. The gas flow automatically charges the LCV until the pressure sensor detects the target pressure, at which point delivery stops. This self-service mechanism eliminates waste while maintaining ease of operation, thereby improving process efficiency.
Solution Approach 2:
The patent changes the control parameter from time-based or flow-rate-based dosing to pressure-based dosing. By controlling the LCV pressure to a specific set point, the system precisely determines the gas dose without waste, improving both ease of operation and process efficiency simultaneously.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system reduces precursor gas waste and variability, enhancing process efficiency and consistency by delivering precise doses to the process chamber, thereby reducing the cost-of-operation and improving deposition quality.
Implementation Method 1
A line charge-volume (LCV) to store precursor gas at a predefined pressure
Implementation Method 2
employs a flow controller to maintain a set point flow independently of inlet valves
Implementation Method 3
A pressure sensor to determine when the LCV has received the initial single-dose
Data Source
AI summary
Various embodiments include systems and apparatuses for divertless dosing of process gases, including divertless dosing of precursor gases in deposition systems. In one example, the disclosed subject matter is a divertless, pressure-based gas-dosing system that includes a process gas inlet coupled to an inlet valve, a flow controller coupled to be downstream of the inlet valve, and a line charge-volume (LCV) coupled to be downstream of the inlet valve and the flow controller. The LCV is to receive an initial single-dose of the process gas. A pressure sensor is coupled to the LCV to determine a pressure level within the LCV and an outlet valve is pneumatically coupled to be downstream of the LCV. The outlet valve is to be coupled pneumatically on a downstream side of the outlet valve to a process chamber. Other systems, apparatuses, and methods are disclosed.