Divided Supply Tank Layout for Stable Process Liquid Temperature
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Solution Overview
Problem
In single-wafer-type substrate processing devices, the temperature control of the process liquid becomes difficult due to irregular and variable collection of the process liquid, leading to non-uniformity in the etching depth.
Innovation Solution
A supply tank system with a container divided into regions by dividing plates, where the process liquid is introduced and heated in one region and then supplied to the substrate processing device from another region, maintaining stable liquid temperature through insulation and controlled heating.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the tank collects process liquid from multiple substrate processing devices, then the productivity is improved, but the temperature control becomes difficult
Solution Approach 1:
The tank is divided into a collection region and a supply region using a dividing plate. The collection region receives process liquid from multiple substrate processing devices, while the supply region maintains stable temperature for supply. This spatial segmentation allows simultaneous collection from multiple sources without compromising the temperature stability required for substrate processing, thus resolving the contradiction between improved productivity and difficult temperature control.
2Adaptability or versatility
If the process liquid is collected irregularly and at variable amount, then the collection flexibility is improved, but the temperature control accuracy deteriorates
Solution Approach 1:
The dividing plate creates independent collection and supply regions. The collection region can accept variable amounts of process liquid from multiple devices with different collection timings, while the supply region maintains stable temperature conditions. This segmentation decouples the flexibility of collection from the precision requirements of supply, resolving the contradiction between collection flexibility and temperature control accuracy.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The supply tank system effectively stabilizes the liquid temperature of the process liquid, facilitating precise temperature control and reducing non-uniformity in the etching depth, thereby enhancing the productivity and quality of the substrate processing.
Implementation Method 1
a heater which heats the process liquid
Implementation Method 2
maintaining stable liquid temperature through insulation and controlled heating
Data Source
AI summary
According to one embodiment, provided is a supply tank a supply device, and a supply system that stabilizes the liquid temperature of a process liquid to be supplied to a substrate processing device. A supply tank that supplies a process liquid to a substrate processing device includes a container that stores the process liquid, a first dividing plate that divides the container into a first region where the process liquid is introduced, and a second region that supplies the process liquid to the substrate processing device, first piping that feeds, to the second region, the process liquid introduced in the first region, and a first heater which is provided on a path through the first piping, and which heats the process liquid.