Digital Exposure Device Using DMD for Simultaneous Pattern Formation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing photolithography methods for manufacturing printed circuit boards and LCD panels are costly due to the need for precise and expensive photo masks, especially as substrate sizes increase, and digital exposure methods require significant equipment investment and processing time.
Innovation Solution
A digital exposure method and device that generates graphic data system files for multiple patterns, using a digital micromirror device to control exposure beams, allowing for simultaneous exposure of different areas with varying scanning speeds to simplify the process and reduce costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photolithography methods using photo masks are used, then manufacturing precision is maintained, but manufacturing cost increases due to expensive photo masks
Solution Approach 1:
The patent uses digital data files (GDS files) to store pattern information, which can be repeatedly copied and used for multiple exposure operations. This eliminates the need for physical photo masks while maintaining pattern precision, as the digital patterns can be accurately reproduced through the DMD device without the cost of manufacturing and maintaining physical masks.
Solution Approach 2:
The patent replaces the mechanical photo mask system with a digital micromirror device (DMD) controlled by digital data. The DMD uses electronically controlled micro-mirrors to modulate the exposure beam according to digital pattern data, substituting the physical mask mechanism with an electronic control system that achieves the same patterning function without the associated costs.
2Ease of manufacture
If digital exposure method is used, then photo mask cost is eliminated, but equipment investment and processing time increase
Solution Approach 1:
The patent combines multiple exposure operations (main exposure for display panels, titler exposure for identification numbers, and edge exposure for peripheral regions) into a single integrated exposure device. By using one DMD to perform all three functions sequentially, the system eliminates the need for multiple separate exposure devices, thereby reducing both equipment investment and total processing time.
Solution Approach 2:
The DMD is designed to perform multiple functions: it can expose main display panel patterns, titler patterns for identification numbers, and edge patterns for peripheral regions. This multi-functional capability allows a single device to replace what would traditionally require three separate exposure devices, reducing equipment costs and streamlining the manufacturing process.
3Manufacturing precision
If multiple exposure devices are used for main exposure, titler exposure, and edge exposure, then pattern quality is maintained, but device complexity and equipment investment increase
Solution Approach 1:
The patent merges three separate exposure devices into one integrated exposure device with a single DMD. The system uses different GDS files and control sequences to perform main exposure, titler exposure, and edge exposure sequentially, maintaining pattern quality while significantly reducing device complexity and equipment investment.
Solution Approach 2:
The DMD dynamically reconfigures its mirror orientations based on the specific exposure task at hand. By controlling the tilt angles of micro-mirrors according to different GDS files, the single device adapts to perform different exposure functions (main patterns, titlers, edges) with the same precision as dedicated devices would provide.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables simultaneous exposure of multiple patterns, including display panels, identification numbers, and edge areas, thereby simplifying the exposure process and reducing manufacturing costs by eliminating the need for multiple photo masks and optimizing equipment usage.
Implementation Method 1
a digital micromirror device on/off data is generated from the graphic data system file. The substrate is then exposed in response to the digital micromirror device on/off data
Data Source
AI summary
A digital exposure method and a digital exposure device for performing the method are disclosed. In the method, a graphic data system file is produced in correspondence with each of a plurality of patterns formed on a substrate. Then, a digital micromirror device on/off data is generated from the graphic data system file. Then, the substrate is exposed in response to the digital micromirror device on/off data. Thus, at least a first exposure for forming a first pattern of a display panel, and a second exposure for forming identification numbers of a substrate and each display panel and removing an edge portion of the substrate may be simultaneously performed, to simplify the exposure process decrease costs.