DMD Laser Plasma Substrate Processing for Selective Thin-Film Etching
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Solution Overview
Problem
Existing substrate processing methods using plasma heating struggle with uniformity and selective etching, particularly when thin films have varying thicknesses across different regions, leading to challenges in asymmetric etching and film formation.
Innovation Solution
An apparatus and method utilizing a Digital Micro-mirror Device (DMD) to modulate laser beams, allowing for selective heating and etching by adjusting heat energy distribution across local substrate regions through a laser emission unit with rotatable micromirrors and a beam shaper, combined with plasma excitation and gas supply control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a laser beam is emitted to the entire region of the substrate to heat it uniformly, then the substrate heating is achieved, but it is impossible to selectively etch local regions with different thin film thicknesses
Solution Approach 1:
The patent segments the laser beam into multiple independent regions using a Digital Micromirror Device (DMD), where each micromirror corresponds to a specific region on the substrate. This allows different regions to receive different amounts of laser energy independently, enabling selective heating and etching of local regions while maintaining overall substrate heating capability.
Solution Approach 2:
The patent applies local quality by allowing different regions of the substrate to receive customized laser energy distribution. Each micromirror on the DMD can be independently controlled to adjust the intensity and duration of laser exposure for specific regions, enabling precise control over heating and etching amounts for each local area based on the thin film thickness distribution.
2Productivity
If the laser beam intensity is increased to improve etching speed, then productivity increases, but the risk of damaging the substrate or creating non-uniform etching increases
Solution Approach 1:
The patent employs periodic action by controlling each micromirror to switch between reflective and non-reflective states in a sequential or pulsed manner. This allows the laser beam to be delivered in controlled time intervals to different regions, enabling high etching speeds through rapid switching while maintaining uniformity through precise temporal control of energy delivery.
Solution Approach 2:
The patent applies dynamics by making the laser beam distribution dynamic and adjustable in real-time. The DMD allows the laser energy distribution to be dynamically modified for each region based on the thin film thickness map, enabling the system to adapt the etching parameters on-the-fly to achieve both high speed and uniformity without physical reconfiguration.
3Manufacturing precision
If a DMD unit with multiple micromirrors is used to modulate the laser beam for selective heating, then selective etching capability is improved, but the device complexity increases
Solution Approach 1:
The patent replaces complex mechanical beam steering systems with a Digital Micromirror Device (DMD) that uses electronically controlled micromirrors. Instead of mechanically moving mirrors or lenses to redirect the laser beam, the DMD uses electronic signals to tilt micromirrors and control light reflection, significantly reducing mechanical complexity while enhancing precision and programmability of the selective heating process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise control over heating and etching amounts, ensuring uniform thin film formation even with asymmetric thickness distributions, enhancing substrate processing efficiency and precision.
Implementation Method 1
a plasma source providing energy that excites the gas introduced in the treatment space using plasma
Implementation Method 2
a laser emission unit disposed above the supporting unit and emitting a laser beam to a substrate placed on the supporting unit
Implementation Method 3
heating the substrate by emitting a laser beam
Implementation Method 4
a Digital Micro-mirror Device (DMD) unit that is a light modulation unit modulating the laser beam generated from the laser source, wherein the DMD unit includes: micromirrors provided to be rotatable
Data Source
AI summary
The present invention provides an apparatus of processing a substrate. The apparatus of processing a substrate includes: a chamber providing a treatment space; a substrate supporting unit provided in the treatment space; a gas supply unit introducing gas into the treatment space; a plasma source providing energy that excites the gas introduced in the treatment space using plasma; an exhaust unit exhausting an atmosphere in the treatment space out of the treatment space; and a laser emission unit disposed above the supporting unit and emitting a laser beam to a substrate placed on the supporting unit, wherein the laser emission unit includes: a laser source generating the laser beam; and a Digital Micro-mirror Device (DMD) unit that is a light modulation unit modulating the laser beam generated from the laser source, wherein the DMD unit includes: micromirrors provided to be rotatable; and a board substrate on which the micromirrors are installed.