DMD Maskless Lithography Biasing for Sub-Resolution Features
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Solution Overview
Problem
Existing maskless lithography techniques struggle to create smaller patterns efficiently and cost-effectively on large area substrates for high-resolution displays without hardware modifications.
Innovation Solution
A software application that biases the number of electromagnetic radiation shots or adjusts the target polygon size to form features below the native resolution of a digital micromirror device (DMD), enhancing image resolution while maintaining high image contrast.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the DMD mirror size and hardware optics are used to determine the minimum feature size, then the manufacturing process is simple and cost-effective, but the manufacturing precision is limited to a specific resolution threshold
Solution Approach 1:
The patent changes the parameters of the exposure process by applying line bias (adjusting polygon dimensions) and shot bias (adjusting number of shots) to modify the effective feature size below the hardware-determined minimum feature size, thereby improving manufacturing precision without changing hardware
Solution Approach 2:
The patent replaces the mechanical/optical limitation (DMD mirror size determining minimum feature size) with a computational/software-based approach (biasing algorithms) to achieve finer feature sizes, substituting hardware constraints with software control
2Manufacturing precision
If multiple exposures and edge shifting are used to achieve smaller line-widths, then the manufacturing precision improves, but the productivity decreases due to increased process steps
Solution Approach 1:
The patent segments the exposure process into discrete shots that can be independently controlled and biased, allowing parallel processing and optimization of both precision and throughput by distributing shots across multiple mirrors
Solution Approach 2:
The patent uses periodic scanning of the DMD mirrors across the substrate, with each mirror performing multiple shots at different positions, enabling efficient utilization of hardware resources while achieving precise line-width control through shot biasing
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the formation of smaller features than conventional hardware allows, such as extending a DMD suitable for 3.6 µm pixels to generate 2.35 µm pixels without hardware changes, improving resolution and efficiency in maskless lithography.
Implementation Method 1
Electromagnetic radiation is delivered to reflect off of a first mirror of the DMD when the centroid for the first mirror is within the one or more target polygons
Data Source
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AI summary
The embodiments described herein relate to a software application platform, which enhances image patterns resolution on a substrate. The application platform method includes running an algorithm to provide different target polygons for forming a pattern on a target. A minimum feature size which may be formed by a DMD is determined. For each target polygons smaller than the minimum feature size determining to line bias or shot bias the one or more target polygons to achieve an acceptable exposure contrast at the target polygon boundary. The one or more target polygons smaller than the minimum feature size are biased to form a digitized pattern on the substrate. Electromagnetic radiation is delivered to reflect off of a first mirror of the DMD when the centroid for the first mirror is within the one or more target polygons.