DMOS Transistor ESD Protection via Parasitic Capacitance

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Solution Overview

Problem

Existing semiconductor protection circuits face challenges in effectively protecting high-voltage terminals from Electro-Static Discharge (ESD) due to inadequate capacitive coupling, which can lead to degraded functionality and increased manufacturing complexity.

Innovation Solution

The use of DMOS transistors with innovative parasitic capacitance configurations, including pn-junction and MOS capacitances, to enhance capacitive coupling and ensure reliable ESD protection without the need for additional capacitive elements, thereby reducing manufacturing steps and improving area efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If only gate-drain parasitic capacitance of MOS is used as capacitive element, then the protection circuit structure is simple, but capacitive coupling is insufficient and gate-source voltage cannot be sufficiently secured

Engineering Contradiction:
Improveprotection circuit structureVSAvoidcapacitive coupling sufficiency
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent combines gate-drain parasitic capacitance and gate-source parasitic capacitance of the MOS transistor to form a composite capacitive element. This merging of two parasitic capacitances provides sufficient capacitive coupling for ESD protection while maintaining circuit simplicity and avoiding additional manufacturing steps.

Inventive Principle:
Principle #5Merging (Combining)

2Reliability

If oxide film capacitance is used by thickening gate oxide film, then high breakdown voltage is achieved, but the number of manufacturing steps increases

Engineering Contradiction:
Improvebreakdown voltageVSAvoidnumber of process steps
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent utilizes the inherent parasitic capacitances that already exist in the MOS transistor structure without requiring additional manufacturing steps. The gate-drain and gate-source parasitic capacitances are naturally formed during standard MOS fabrication, allowing the circuit to serve its own capacitive function without external assistance or additional processing.

Inventive Principle:
Principle #25Self-service

3Reliability

If pn-junction capacitance is used, then high breakdown voltage is achieved, but area efficiency deteriorates and cost increases

Engineering Contradiction:
Improvebreakdown voltageVSAvoidcapacitive element area
Core Design Contradiction:
ReliabilityVSArea of stationary object

Solution Approach 1:

The MOS transistor serves multiple functions simultaneously: it acts as the protection switch, provides capacitive coupling through its parasitic capacitances, and offers high breakdown voltage capability. This multi-functionality eliminates the need for separate capacitive elements that would occupy additional area, making the transistor a universal component for ESD protection.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach effectively turns on transistors to manage surge currents, providing robust ESD protection for high-voltage terminals while minimizing process complexity and maintaining high breakdown voltages, thus preventing erroneous writes in anti-fuse elements and ensuring reliable operation.

Implementation Method 1

voltage fluctuations in a voltage line is transmitted to the gate of a transistor M1 via a gate-drain parasitic capacitance of the transistor M1

Methodology Applied
Scientific EffectCapacitive coupling: Capacitance

Implementation Method 2

gate-drain parasitic capacitance of the transistor M1

Methodology Applied
Scientific EffectParasitic capacitance: Parasitic Capacitance

Implementation Method 3

a current flows from the voltage line to the ground line, discharging the surge voltage in the voltage line

Methodology Applied
Scientific EffectElectrical conduction: Conduction (electrical)

Data Source

PatentEP3229271B1Semiconductor device and liquid discharge head substrate
Publication Date: 2022.05.11 CANON KK
  • EP3229271B1 patent drawingFigure 1~2
  • EP3229271B1 patent drawingFigure 3~4
  • EP3229271B1 patent drawingFigure 5~6

AI summary

A semiconductor device is provided. The device comprises: a first transistor that includes a first primary terminal, a second primary terminal and a first control terminal; a second transistor that includes a third primary terminal, a fourth primary terminal and a second control terminal; and a resistive element. The first and third primary terminal are connected to a first voltage line. The second primary terminal and one terminal of the resistive element are connected to a second voltage line. The first and second control terminal, the fourth primary terminal and the other terminal of the resistive element are connected to a node. A potential change in the third primary terminal is transmitted to the first control terminal by capacitive coupling between the third primary terminal and the node, turning on the first transistor.