DNA Optical Synthesis Image Inversion for Precise Deprotection
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Solution Overview
Problem
In photochemical DNA synthesis, light diffraction, scattering, and reflection cause undesired deprotection of DNA in non-targeted regions and insufficient light reaching targeted regions, leading to errors in DNA synthesis.
Innovation Solution
A method involving deprotecting and capping DNA in regions excluding the desired synthesis area, followed by deprotection and coupling in the desired region, using a reverse-irradiation and irradiation approach.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If light is applied to deprotect DNA in the synthesis region, then DNA deprotection occurs at targeted sites, but light diffraction and scattering cause deprotection at non-targeted sites
Solution Approach 1:
The patent divides the light irradiation process into two distinct stages: first irradiating the reverse region (non-synthesis area) to deprotect and cap DNA there, then irradiating the synthesis region to deprotect and couple nucleotides. This segmentation separates the harmful effects in different spatial regions, preventing cross-contamination and improving synthesis precision.
Solution Approach 2:
The patent performs preliminary deprotection and capping in the reverse region before the actual synthesis in the target region. By pre-processing the non-synthesis areas to prevent unwanted deprotection, the method eliminates harmful side effects before they can interfere with the main synthesis process.
2Manufacturing precision
If light is applied to deprotect DNA, then deprotection occurs, but insufficient light reaches edge regions causing incomplete deprotection
Solution Approach 1:
The patent inverts the conventional approach by first irradiating the reverse region (edges and non-synthesis areas) before irradiating the central synthesis region. This inversion ensures that edge regions receive adequate light exposure during the first irradiation step, achieving complete deprotection and capping before the main synthesis occurs.
3Productivity
If conventional photochemical synthesis is used, then DNA synthesis can proceed, but errors occur due to light distribution issues
Solution Approach 1:
The patent segments the synthesis process into distinct phases: reverse region processing (deprotection and capping) followed by synthesis region processing (deprotection and nucleotide coupling). This segmentation allows each region to be optimized independently, maintaining high productivity while eliminating errors through precise spatial control.
Solution Approach 2:
The patent introduces a capping step as an intermediary process between deprotection and nucleotide coupling in the reverse region. This intermediary action prevents unwanted side reactions and ensures that only properly processed DNA strands proceed to synthesis, thereby improving reliability without sacrificing productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Significantly reduces errors caused by insufficient light arrival during DNA synthesis, ensuring precise and accurate DNA synthesis.
Implementation Method 1
deprotecting DNA located in a reverse-irradiation region by applying light on the reverse-irradiation region of a DNA synthesis substrate
Implementation Method 2
deprotecting DNA located in the irradiation region by applying light to the irradiation region of the DNA synthesis substrate
Data Source
AI summary
The present invention is a technology that can reduce errors occurring due to insufficient light in the DNA synthesis process, wherein DNA is deprotected and capped first in areas other than the desired DNA synthesis area and then deprotected and coupled in the desired DNA synthesis area, whereby unwanted DNA deprotection can be prevented and, as a result, DNA synthesis errors can be reduced.