Door Assembly Tunnel Features for Substrate Processing
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Solution Overview
Problem
Conventional substrate processing chambers face issues with the accumulation of etch byproducts, leading to the formation of stringers that obstruct door tunnels, reduce processing efficiency, and cause yield loss, due to the difficulty in maintaining a sealed chamber and the inefficiency of conventional cleaning methods.
Innovation Solution
A door assembly with a grid pattern of features along the tunnel that promotes the sticking of built-up material, inhibiting the formation of stringers, and an enlarged door with a wide surface for a tighter seal, which minimizes the accumulation of deposits and reduces the frequency of cleaning operations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional door assemblies are used, then substrates can be loaded and unloaded, but etch byproducts accumulate in the door tunnel forming stringers that obstruct the tunnel and scratch wafers
Solution Approach 1:
The door tunnel surface is segmented into multiple grooves that divide the accumulation area. This segmentation prevents continuous stringer formation along the tunnel wall by creating discrete accumulation zones within each groove, thereby eliminating the harmful hanging formations that scratch wafers while maintaining processing throughput
Solution Approach 2:
Instead of preventing byproduct accumulation entirely, the invention converts the harmful accumulation into a beneficial contained structure. The grooves capture and contain the byproducts in discrete locations, transforming the harmful stringers into contained deposits that do not obstruct the tunnel or scratch wafers, thus converting a harmful effect into an acceptable state
2Reliability
If the door assembly leaks, then gases flow through the door tunnel drawing in etch byproducts that accumulate and form stringers, but repositioning the door to eliminate leaks is difficult
Solution Approach 1:
The invention accepts that leaks may occur and converts the harmful effect of byproduct accumulation into a beneficial contained structure. The grooves capture byproducts drawn in through leaks, preventing stringer formation while allowing the door to remain in its positioned state without requiring difficult repositioning operations
3Object-affected harmful factors
If wet cleaning operations are performed to remove stringers, then the tunnel can be cleared, but significant down-time is required reducing processing throughput
Solution Approach 1:
The grooves convert the harmful stringer formation into contained deposits that remain in the grooves rather than forming obstructive hanging formations. This conversion eliminates the need for frequent wet cleaning operations, thereby maintaining continuous processing and preserving throughput while still managing byproduct accumulation
Solution Approach 2:
By segmenting the tunnel surface into grooves, the invention creates discrete accumulation zones that prevent the formation of large obstructive stringers. This segmentation allows the tunnel to remain functional without requiring shutdown for cleaning, as the segmented deposits do not obstruct substrate transport
4Ease of operation
If conventional smooth tunnel surfaces are used, then substrates can pass through easily, but byproducts accumulate and peel forming stringers that obstruct the tunnel
Solution Approach 1:
The smooth surface is segmented into grooves that maintain substrate transport capability while providing designated accumulation zones. The grooves are configured to allow substrate passage while capturing byproducts, preventing the formation of peeling stringers that would obstruct the tunnel and damage wafers
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces the formation of stringers, maintains tunnel clearance, and increases the time between cleaning operations, thereby enhancing processing efficiency and reducing yield loss by ensuring substrates are moved securely and minimizing damage during transport.
Implementation Method 1
one or more patterns of features that cooperate to enhance sticking of built-up solid material to ensure that the built-up material remains attached to the entrance
Implementation Method 2
The grid door tunnel has grooves in a grid pattern to allow polymer to build up inside the grooves
Data Source
AI summary
A substrate processing apparatus includes an enclosure defining a reaction chamber, a substrate holder in the reaction chamber, and a door assembly. The door assembly has a substrate entrance with a tunnel extending to the reaction chamber, a door movable with respect to the substrate entrance, and a pattern of features. The features are located along a portion of the substrate entrance defining the tunnel. The features promote sticking of processing byproducts, produced in the reaction chamber, to the substrate entrance. A door mates with the entrance to form a seal that reduces flow through the tunnel to control the amount of byproducts that enter the tunnel.